SCHEMBL18697239

SCHEMBL18697239

Cc1ccccc1C(=O)c1ccccc1Sc1ccccc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.61
SIRT1 Q96EB6 1/20 0.59
HPGD P15428 3/20 0.44
NPC1 O15118 1/20 0.44
RAB9A P51151 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
KMT2A Q03164 2/20 0.44
CYP3A4 P08684 1/20 0.44
CYP2C9 P11712 1/20 0.44
MAPT P10636 3/20 0.43
TDP1 Q9NUW8 2/20 0.43
MEN1 O00255 1/20 0.43
LMNA P02545 1/20 0.43
MAPK13 O15264 1/20 0.42
MAPK12 P53778 1/20 0.42
MAPK11 Q15759 1/20 0.42
MAPK14 Q16539 1/20 0.42
ERCC5 P28715 1/20 0.41
FEN1 P39748 1/20 0.41
ALDH1A1 P00352 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8959187 0.89 SIRT1 (0.71) L3MBTL1SIRT1HPGDSMN1; SMN2KMT2A
SCHEMBL2129013 0.80 SIRT1 (0.65) L3MBTL1SIRT1HPGDRAB9AKMT2A
SCHEMBL11301003 0.79 ALDH1A1 (0.58) L3MBTL1HPGDNPC1RAB9ASMN1; SMN2
SCHEMBL3281852 0.79 L3MBTL1 (0.54) L3MBTL1SIRT1HPGDNPC1RAB9A
SCHEMBL333141 0.79 CYP3A4 (0.55) HPGDSMN1; SMN2KMT2ACYP3A4CYP2C9
SCHEMBL29387256 0.79 CYP3A4 (0.55) HPGDSMN1; SMN2KMT2ACYP3A4CYP2C9
SCHEMBL2417850 0.78 SIRT1 (0.67) L3MBTL1SIRT1HPGDSMN1; SMN2KMT2A
SCHEMBL231042 0.77 SIRT1 (0.71) L3MBTL1SIRT1HPGDRAB9ASMN1; SMN2
Diphenylsulfane SCHEMBL29164342 0.77 KMT2A (0.49) L3MBTL1SIRT1HPGDNPC1RAB9A
SCHEMBL2233495 0.77 AKR1C3 (0.56) L3MBTL1SIRT1NPC1RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3081988-B1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2017-08-16 EP disclosed
EP-3205640-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2017-08-16 EP disclosed
EP-3032333-B1 SHRINK MATERIAL AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2017-05-24 EP disclosed
EP-3168207-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2017-05-17 EP disclosed
EP-3032332-B1 SHRINK MATERIAL AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2017-04-05 EP disclosed