SCHEMBL2129013

SCHEMBL2129013

O=C(c1ccccc1)c1ccccc1Sc1ccccc1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIRT1 Q96EB6 1/20 0.65
AKR1C3 P42330 1/20 0.53
TDP1 Q9NUW8 4/20 0.53
MAPT P10636 2/20 0.53
GAA P10253 1/20 0.50
ALDH1A1 P00352 5/20 0.48
L3MBTL1 Q9Y468 3/20 0.46
HPGD P15428 1/20 0.44
POLB P06746 1/20 0.44
ATM Q13315 2/20 0.43
CDC25B P30305 1/20 0.43
GLA P06280 1/20 0.43
MEN1 O00255 1/20 0.42
BLM P54132 1/20 0.42
KMT2A Q03164 1/20 0.42
HSP90AA1 P07900 1/20 0.42
PKM P14618 1/20 0.42
CCR6 P51684 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
TLR9 Q9NR96 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9625444 0.93 SIRT1 (0.56) SIRT1AKR1C3TDP1MAPTGAA
SCHEMBL1127672 0.92 SIRT1 (0.56) SIRT1AKR1C3TDP1MAPTGAA
Acetophenone SCHEMBL28395442 0.92 ALDH1A1 (0.59) SIRT1AKR1C3TDP1MAPTGAA
SCHEMBL9625706 0.90 AKR1C3 (0.59) SIRT1AKR1C3TDP1MAPTGAA
SCHEMBL8959187 0.90 SIRT1 (0.71) SIRT1TDP1MAPTALDH1A1L3MBTL1
SCHEMBL28682830 0.90 SRD5A2 (0.55) SIRT1AKR1C3TDP1MAPTGAA
SCHEMBL9624875 0.88 TDP1 (0.53) SIRT1AKR1C3TDP1MAPTGAA
SCHEMBL8967852 0.88 NR4A1 (0.60) SIRT1TDP1MAPTALDH1A1L3MBTL1
SCHEMBL2233495 0.88 AKR1C3 (0.56) SIRT1AKR1C3TDP1MAPTGAA
SCHEMBL27641577 0.88 SIRT1 (0.56) SIRT1AKR1C3TDP1MAPTGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111154067-A Low-viscosity high-peel-strength UV (ultraviolet) curing composite adhesive and preparation method thereof 江苏景宏新材料科技有限公司 2020-05-15 CN claimed
CN-118480014-A Aminoketone photoinitiator containing diphenyl ketone structure 深圳有为技术控股集团有限公司 2024-08-13 CN disclosed
CN-109843853-A The manufacturing method of composition and the equipment using the composition 东洋合成工业株式会社 2019-06-04 CN disclosed
EP-3205640-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2017-08-16 EP disclosed
CN-101687781-B Compound for photoacid generator and use its anti-corrosion agent composition, pattern formation method CENTRAL GLASS CO.,LTD. (JP) 2015-08-12 CN disclosed
EP-2349993-B1 SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS BASF SE (DE) 2012-12-12 EP disclosed
EP-1471078-B1 Free radical polymerization method MINNESOTA MINING & MFG (US) 2012-04-25 EP disclosed
WO-2011104127-A1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2011-09-01 WO disclosed
WO-2010046240-A1 SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS BASF SE (DE) 2010-04-29 WO disclosed
CN-101687781-A Compound for photoacid generator, resist composition using the same, and pattern-forming method CENTRAL GLASS CO LTD 2010-03-31 CN disclosed
EP-1093471-B1 FREE RADICAL POLYMERIZATION METHOD MINNESOTA MINING & MFG (US) 2007-12-05 EP disclosed
EP-0279217-B1 PROCESS FOR THE PREPARATION OF POLY(ARYLENSULFIDES) WITH ADJUSTABLE MELT VISCOSITY BAYER AG (DE) 1992-03-11 EP disclosed
EP-0279217-A1 Process for the preparation of poly(arylensulfides) with adjustable melt viscosity BAYER AG (DE) 1988-08-24 EP disclosed