Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL28614626 | 0.96 | — | — | |
| SCHEMBL1725 | 0.95 | — | — | |
| Methane SCHEMBL16107120 | 0.91 | — | — | |
| Methylamine SCHEMBL22830451 | 0.91 | — | — | |
| Hydrochloric Acid SCHEMBL358299 | 0.91 | — | — | |
| Hydrochloric Acid SCHEMBL15112570 | 0.91 | TSHR (0.46) | — | |
| SCHEMBL15821668 | 0.91 | — | — | |
| Bromide SCHEMBL1566230 | 0.91 | — | — | |
| Ammonia Solution, Strong SCHEMBL851616 | 0.91 | — | — | |
| SCHEMBL28416649 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120081407-A | Preparation method of high-purity spherical-like nano yttrium oxide powder | 广州建丰稀土有限公司 | 2025-06-03 | — | — | CN | claimed |
| CN-114685378-B | Preparation method of 4, 6-dihydroxypyrimidine | 南通泰禾化工股份有限公司 | 2025-03-04 | — | — | CN | claimed |
| CN-112859549-B | Developing solution for retarding AlN substrate corrosion | 宁波南大光电材料有限公司 | 2025-02-21 | — | — | CN | claimed |
| US-12054578-B2 | Process for producing porous materials | AEROGEL-IT GMBH (DE) | 2024-08-06 | — | — | US | claimed |
| CN-118125467-A | Preparation method and application of Nb-Beta molecular sieve | 中国科学院大连化学物理研究所 | 2024-06-04 | — | — | CN | claimed |
| CN-117797860-B | Treatment of N in vehicle exhaust2Sectional catalyst of O and preparation method | 中汽研汽车检验中心（天津）有限公司 | 2024-05-03 | — | — | CN | claimed |
| CN-117886346-A | Method for controlling morphology of boehmite | 安徽壹石通材料科技股份有限公司 | 2024-04-16 | — | — | CN | claimed |
| WO-2024016538-A1 | CONCRETE PROTECTION MATERIAL, PREPARATION METHOD THEREFOR, AND CONSTRUCTION METHOD THEREOF | 高速铁路建造技术国家工程研究中心 | 2024-01-25 | — | — | WO | claimed |
| US-20240014387-A1 | ELECTRODE STRUCTURE FOR ANODE, MANUFACTURING METHOD THEREFOR, AND SECONDARY BATTERY COMPRISING SAME | INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS (KR) | 2024-01-11 | — | — | US | claimed |
| CN-117247517-A | Benzoxazine resin-based macromolecular surfactant and preparation method and application thereof | 衡水学院 | 2023-12-19 | — | — | CN | claimed |
| EP-1266956-A1 | Composition for washing a polishing pad and method for washing a polishing pad | JSR Corporation (JP) | 2002-12-18 | — | — | EP | claimed |
| US-6440326-B1 | QUATERNARY AMMONIUM HYDROXIDE, WATER SOLUBLE AMINE, AN ALKYLPYRROLIDONE, AND A SUGAR OR SUGAR ALCOHOL; WIRING PROCESS OF A SEMICONDUCTOR INTEGRATED CIRCUIT OR A LIQUID CRYSTAL DISPLAY | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-08-27 | — | — | US | claimed |
| WO-2001040425-A2 | POST CHEMICAL-MECHANICAL PLANARIZATION (CMP) CLEANING COMPOSITION | ESC, INC. (US) | 2001-06-07 | — | — | WO | claimed |
| US-6194366-B1 | Post chemical-mechanical planarization (CMP) cleaning composition | ESC, INC. | 2001-02-27 | — | — | US | claimed |
| EP-1027415-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | Kyzen Corporation (US) | 2000-08-16 | — | — | EP | claimed |
| WO-1999016855-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | KYZEN CORPORATION (US) | 1999-04-08 | — | — | WO | claimed |
| US-5846695-A | Removing agent composition for a photoresist and process for producing a semiconductor integrated circuit | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1998-12-08 | — | — | US | claimed |
| EP-0556216-B1 | PHOSPHORIC ACID ESTERS AND THEIR USE IN THE PREPARATION OF BIOCOMPATIBLE SURFACES | BIOCOMPATIBLES LTD (GB) | 1997-06-04 | — | — | EP | claimed |
| EP-0518959-B1 | METHOD OF IMPROVING THE OCULAR HAEMO AND BIOCOMPATIBILITY OF SYNTHETIC POLYMERS | BIOCOMPATIBLES LTD (GB) | 1996-11-20 | — | — | EP | claimed |
| US-5174816-A | SURFACE TREATING AGENT FOR ALUMINUM LINE PATTERN SUBSTRATE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1992-12-29 | — | — | US | claimed |