Potassium Ion

Potassium Ion

SCHEMBL187986

[K+].[K+].[O-]B([O-])Oc1ccccc1

nearest known ligand 0.43

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 3/20 0.43
TSHR P16473 1/20 0.43
CA4 P22748 1/20 0.39
KCNA3 P22001 1/20 0.36
CA5A P35218 1/20 0.35
CA5B Q9Y2D0 1/20 0.35
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
NR1H2 P55055 1/20 0.33
BAX Q07812 1/20 0.33
MAOA P21397 1/20 0.33
SOS1 Q07889 1/20 0.32
LMNA P02545 1/20 0.32
GAA P10253 1/20 0.32
KMT2A Q03164 1/20 0.32
TAAR1 Q96RJ0 1/20 0.32
ALDH1A1 P00352 1/20 0.32
RECQL P46063 1/20 0.32
CA9 Q16790 1/20 0.32
SRC P12931 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28459811 0.94 LTA4H (0.43) LTA4HTSHRCA4KCNA3CA5A
SCHEMBL29118344 0.94 LTA4H (0.43) LTA4HTSHRCA4KCNA3CA5A
SCHEMBL29232696 0.94 LTA4H (0.43) LTA4HTSHRCA4KCNA3CA5A
SCHEMBL414391 0.94 LTA4H (0.43) LTA4HTSHRCA4KCNA3CA5A
SCHEMBL188076 0.94 LTA4H (0.43) LTA4HTSHRCA4KCNA3CA5A
SCHEMBL31538469 0.94 LTA4H (0.43) LTA4HTSHRCA4KCNA3CA5A
Lithium Ion SCHEMBL188290 0.94 LTA4H (0.43) LTA4HTSHRCA4KCNA3CA5A
SCHEMBL187417 0.94 LTA4H (0.43) LTA4HTSHRCA4KCNA3CA5A
Lithium Ion SCHEMBL28887480 0.94 LTA4H (0.43) LTA4HTSHRCA4KCNA3CA5A
SCHEMBL29213652 0.94 LTA4H (0.43) LTA4HTSHRCA4KCNA3CA5A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119842323-A CMP composition for obtaining high-quality SiC monocrystal substrate surface and preparation method thereof 郑州磨料磨具磨削研究所有限公司 2025-04-18 CN claimed
US-8785529-B2 Nucleating agents for polyolefins based on metal salts RELIANCE INDUSTRIES LIMITED (IN) 2014-07-22 US claimed
EP-2523999-A2 NUCLEATING AGENTS FOR POLYOLEFINS BASED ON METAL SALTS Reliance Industries Limited (IN) 2012-11-21 EP claimed
US-20120289632-A1 NOVEL NUCLEATING AGENTS FOR POLYOLEFINS BASED ON METAL SALTS RELIANCE INDUSTRIES LIMITED (IN) 2012-11-15 US claimed
WO-2011086582-A2 NUCLEATING AGENTS FOR POLYOLEFINS BASED ON METAL SALTS RELIANCE INDUSTRIES LIMITED (IN) 2011-07-21 WO claimed
US-12583966-B2 Curable resin, cured product thereof, resin composition, and method for producing curable resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-03-24 US disclosed
US-20250163213-A1 CURABLE RESIN, CURED PRODUCT THEREOF, AND RESIN COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-05-22 US disclosed
US-20250154315-A1 METHOD FOR PRODUCING CURABLE RESIN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-05-15 US disclosed
CN-119998360-A Thermoplastic resin and molded body comprising thermoplastic resin 三菱瓦斯化学株式会社 2025-05-13 CN disclosed
US-20250136755-A1 CURABLE RESIN, CURED PRODUCT THEREOF, RESIN COMPOSITION, AND METHOD FOR PRODUCING CURABLE RESIN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-05-01 US disclosed
CN-119842323-A CMP composition for obtaining high-quality SiC monocrystal substrate surface and preparation method thereof 郑州磨料磨具磨削研究所有限公司 2025-04-18 CN disclosed
EP-4480986-A1 CURABLE RESIN, CURED PRODUCT OF SAME, AND RESIN COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-12-25 EP disclosed
EP-1304344-A1 METHOD FOR PRODUCING POLYCARBONATE TEIJIN LIMITED (JP) 2003-04-23 EP disclosed
EP-0976773-B1 Process for producing a polycarbonate resin TEIJIN LTD (JP) 2003-04-02 EP disclosed
US-20020183477-A1 Process for producing aromati polycarbonate and method of storing raw materials therefor TEIJIN LIMITED (JP) 2002-12-05 US disclosed
EP-1243607-A1 PROCESS FOR PRODUCING AROMATIC POLYCARBONATE AND METHOD OF STORING RAW MATERIALS THEREFOR TEIJIN LIMITED (JP) 2002-09-25 EP disclosed
US-6380345-B1 PERFORMING A POLYCONDENSATION REACTION OF AN AROMATIC DIOL COMPOUND WITH A CARBONIC ACID DIESTER, WHEREIN REACTION BYPRODUCTS ARE REMOVED AND COLLECTED BY REDUCING THE PRESSURE OF REACTOR BY MEANS OF AN EJECTOR TEIJIN LIMITED (JP) 2002-04-30 US disclosed
US-6252034-B1 Process for producing a polycarbonate resin TELJIN LIMITED (JP) 2001-06-26 US disclosed
EP-1018529-A1 Process for producing polycarbonates TEIJIN LIMITED (JP) 2000-07-12 EP disclosed
EP-0976773-A2 Process for producing a polycarbonate resin TEIJIN LIMITED (JP) 2000-02-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12583966-B2 Curable resin, cured product thereof, resin composition, and method for producing curable resin ARL1, ASH2L, SEM1 LTA4H 1117/4885TSHR 4148/4885CA4 1349/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.