SCHEMBL26575146

SCHEMBL26575146

CC(C)c1cc(OCc2cc(COc3cc(C(C)(C)O)cc(C(C)(C)O)c3)cc(COc3cc(C(C)(C)O)cc(C(C)(C)O)c3)c2)cc(C(C)(C)O)c1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RXRA P19793 1/20 0.35
▸ RXRB P28702 1/20 0.35
▸ MRGPRX4 Q96LA9 1/20 0.35
▸ MAOB P27338 2/20 0.33
▸ CFD P00746 1/20 0.33
▸ F11 P03951 1/20 0.33
▸ TPSB2 P20231 1/20 0.33
▸ RRM1 P23921 1/20 0.33
▸ ALOX5 P09917 1/20 0.32
▸ CYP4F2 P78329 1/20 0.32
▸ CYP4A11 Q02928 1/20 0.32
▸ SPHK1 Q9NYA1 1/20 0.31
▸ PRSS1 P07477 1/20 0.31
▸ PRSS2 P07478 1/20 0.31
▸ PRSS3 P35030 1/20 0.31
▸ KDM4E B2RXH2 3/20 0.31
▸ NPC1 O15118 1/20 0.31
▸ POLB P06746 1/20 0.31
▸ RAB9A P51151 1/20 0.31
▸ PTPRC P08575 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24533738 0.87 MAOB (0.38) RXRARXRBMAOBCYP4F2CYP4A11
SCHEMBL18802918 0.79 APP (0.46) RXRARXRBMAOBPTPRCPTPN1
SCHEMBL15328304 0.78 CYP2D6 (0.38) —
SCHEMBL5164170 0.74 MEN1 (0.51) MAOBALOX5CYP4F2CYP4A11KDM4E
SCHEMBL8898221 0.74 CYP2D6 (0.38) —
SCHEMBL18811515 0.73 RXRA (0.47) RXRARXRBMAOBNPC1RAB9A
SCHEMBL16259555 0.73 GABRA1 (0.44) RXRARXRBKDM4EPOLB
SCHEMBL24533757 0.72 APP (0.50) RXRARXRBMAOBCYP4F2CYP4A11
SCHEMBL24780634 0.71 PSEN1 (0.50) MRGPRX4MAOBRRM1ALOX5
SCHEMBL16259688 0.70 AR (0.39) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4258056-A2 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-11 — — EP disclosed
Send feedback