Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL4584812 | 0.96 | TSHR (0.33) | — | |
| SCHEMBL44443 | 0.95 | — | — | |
| SCHEMBL28364403 | 0.91 | — | — | |
| Hydrochloric Acid SCHEMBL659839 | 0.91 | — | — | |
| Bromide SCHEMBL1566336 | 0.91 | — | — | |
| Ammonia Solution, Strong SCHEMBL3400813 | 0.91 | — | — | |
| Bromide SCHEMBL28612724 | 0.91 | TSHR (0.36) | — | |
| Fluoride SCHEMBL191143 | 0.91 | — | — | |
| Iodide SCHEMBL1567793 | 0.91 | — | — | |
| Iodide SCHEMBL28624181 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 834 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12606916-B2 | Method for reducing or preventing corrosion or fouling caused by acidic compounds | KURITA WATER INDUSTRIES LTD. (JP) | 2026-04-21 | — | — | US | claimed |
| EP-3958292-B1 | CLEANING FLUID, METHOD OF CLEANING, AND METHOD OF PREPARING SEMICONDUCTOR WAFER | MITSUBISHI CHEM CORP (JP) | 2025-04-02 | — | — | EP | claimed |
| US-20250066968-A1 | METHOD FOR DEGUMMING AND DECOLORIZING POLYESTER FABRIC | NAN YA PLASTICS CORPORATION (TW) | 2025-02-27 | — | — | US | claimed |
| CN-119126507-A | Photoresist stripping liquid, preparation method and application thereof | 浙江奥首材料科技有限公司 | 2024-12-13 | — | — | CN | claimed |
| CN-118771403-A | Modified titanium-silicon molecular sieve, titanium-silicon molecular sieve supported metal nanoparticle catalyst, preparation method and propylene gas-phase epoxidation method | 中国石油化工股份有限公司 | 2024-10-15 | — | — | CN | claimed |
| CN-115335549-B | Chromate-free ceramic compositions with reduced cure temperature | 普莱克斯S.T.技术有限公司 | 2024-09-24 | — | — | CN | claimed |
| US-12054578-B2 | Process for producing porous materials | AEROGEL-IT GMBH (DE) | 2024-08-06 | — | — | US | claimed |
| CN-118048204-A | Wafer cleaning liquid for cleaning copper surface after chemical mechanical planarization | 华中科技大学 | 2024-05-17 | — | — | CN | claimed |
| CN-117417728-A | Nanometer abrasive particles, preparation method thereof and application thereof in chemical mechanical polishing | 甬江实验室 | 2024-01-19 | — | — | CN | claimed |
| US-20230416605-A1 | CHEMICAL LIQUID AND TREATMENT METHOD | FUJIFILM CORPORATION (JP) | 2023-12-28 | — | — | US | claimed |
| US-20070100153-A1 | PROCESS FOR PREPARING ORGANICALLY MODIFIED POLYORGANOSILOXANES | GOLDSCHMIDT GMBH (DE) | 2007-05-03 | — | — | US | claimed |
| EP-1334987-B1 | Low temperature curable solid powder lacquer compositions containing urethdione groups | DEGUSSA (DE) | 2006-08-09 | — | — | EP | claimed |
| US-20050239956-A1 | Polyurethane composition which contains an uretdione group | DEGUSSA AG (DE) | 2005-10-27 | — | — | US | claimed |
| US-6914115-B2 | Low-temperature-curable, solid polyurethane powder coating compositions containing uretdione groups | DEGUSSA AG (DE) | 2005-07-05 | — | — | US | claimed |
| US-20050096451-A1 | High-reactivity liquid polyurethane systems which contain uretdione groups and can be cured at a low temperature | DEGUSSA AG (DE) | 2005-05-05 | — | — | US | claimed |
| US-20050096450-A1 | Low temperature curable polyurethane compositions containing uretdione groups | DEGUSSA AG (DE) | 2005-05-05 | — | — | US | claimed |
| US-20040219367-A1 | Low-temperature-curable, solid polyurethane powder coating compositions containing uretdione groups | DEGUSSA AG (DE) | 2004-11-04 | — | — | US | claimed |
| US-20030153713-A1 | Low-temperature-curable, solid polyurethane powder coating compositions containing uretdione groups | DEGUSSA AG (DE) | 2003-08-14 | — | — | US | claimed |
| US-6379500-B2 | Silica-based sols | AKZO NOBEL NV (NL) | 2002-04-30 | — | — | US | claimed |
| US-20010004927-A1 | Aqueous silica-based sol comprising a nitrogen-containing organic compound and silica-based particles with a specific surface area of atleast 300 square meters/gram of silica having S-valule 10-60% | AKZO NOBEL NV (NL) | 2001-06-28 | — | — | US | claimed |