SCHEMBL1887295

SCHEMBL1887295

C=C(C)C(=O)c1ccc(C(=O)c2ccccc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.61
ALDH1A1 P00352 4/20 0.58
CES2 O00748 6/20 0.56
CES1 P23141 5/20 0.56
SRD5A2 P31213 1/20 0.56
MAPT P10636 3/20 0.55
L3MBTL1 Q9Y468 2/20 0.53
LMNA P02545 3/20 0.52
HPGD P15428 3/20 0.52
ATM Q13315 2/20 0.52
RAB9A P51151 2/20 0.52
NPC1 O15118 1/20 0.52
XBP1 P17861 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
NPSR1 Q6W5P4 1/20 0.52
TDP1 Q9NUW8 1/20 0.50
MEN1 O00255 1/20 0.48
KMT2A Q03164 1/20 0.48
MAPK13 O15264 1/20 0.48
MAPK12 P53778 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9663762 0.91 CES2 (0.65) ELANEALDH1A1CES2CES1MAPT
SCHEMBL759658 0.91 CES2 (0.65) ELANEALDH1A1CES2CES1MAPT
SCHEMBL16751998 0.89 ELANE (0.64) ELANEALDH1A1CES2CES1SRD5A2
SCHEMBL16850565 0.89 HPGD (0.56) ELANEALDH1A1CES2CES1SRD5A2
SCHEMBL10893457 0.89 CES2 (0.62) ELANEALDH1A1CES2CES1MAPT
SCHEMBL10893465 0.89 CES2 (0.62) ELANEALDH1A1CES2CES1MAPT
Hydrochloric Acid SCHEMBL27988189 0.89 CES2 (0.62) ELANEALDH1A1CES2CES1MAPT
Dimethylamine SCHEMBL11024706 0.85 CES2 (0.58) ELANEALDH1A1CES2CES1MAPT
SCHEMBL2769635 0.85 CES2 (0.58) ELANEALDH1A1CES2CES1MAPT
Benzophenone SCHEMBL28440686 0.85 ALDH1A1 (0.67) ELANEALDH1A1CES2CES1SRD5A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117222134-A Preparation method of metal electronic circuit 深圳先进电子材料国际创新研究院 2023-12-12 CN claimed
WO-2011104066-A1 BENZOPHENONE-CONTAINING DISPERSIONS FOR TEXTILE APPLICATIONS EVONIK RÖHM GMBH (DE) 2011-09-01 WO claimed
CN-117222134-A Preparation method of metal electronic circuit 深圳先进电子材料国际创新研究院 2023-12-12 CN disclosed
US-10927064-B2 Process for the manufacturing of a compound comprising a (meth)acryloyl group 3M INNOVATIVE PROPERTIES COMPANY (US) 2021-02-23 US disclosed
US-20200369590-A1 PROCESS FOR THE MANUFACTURING OF A COMPOUND COMPRISING A (METH)ACRYLOYL GROUP 3M INNOVATIVE PROPERTIES COMPANY 2020-11-26 US disclosed
EP-3502090-B1 PROCESS FOR THE MANUFACTURING OF A COMPOUND COMPRISING A (METH)ACRYLOYL GROUP 3M INNOVATIVE PROPERTIES CO (US) 2020-08-19 EP disclosed
EP-3502090-A1 PROCESS FOR THE MANUFACTURING OF A COMPOUND COMPRISING A (METH)ACRYLOYL GROUP 3M Innovative Properties Company (US) 2019-06-26 EP disclosed
US-20120302041-A1 Energy Ray-Curable Polymer, an Energy Ray-Curable Adhesive Composition, an Adhesive Sheet and a Processing Method of a Semiconductor Wafer LINTEC CORPORATION (JP) 2012-11-29 US disclosed
US-8304920-B2 Energy ray-curable polymer, an energy ray-curable adhesive composition, an adhesive sheet and a processing method of a semiconductor wafer LINTEC CORPORATION (JP) 2012-11-06 US disclosed
WO-2011104066-A1 BENZOPHENONE-CONTAINING DISPERSIONS FOR TEXTILE APPLICATIONS EVONIK RÖHM GMBH (DE) 2011-09-01 WO disclosed
US-20110104874-A1 Energy Ray-Curable Polymer, an Energy Ray-Curable Adhesive Composition, an Adhesive Sheet and a Processing Method of a Semiconductor Wafer LINTEC CORPORATION (JP) 2011-05-05 US disclosed
US-20100233868-A1 Adhesive Sheet and a Processing Method of Semiconductor Wafer, and a Manufacturing Method of Semiconductive Chip LINTEC CORPORATION (JP) 2010-09-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10927064-B2 Process for the manufacturing of a compound comprising a (meth)acryloyl group ADH5, ALKBH3, METTL3 ELANE 2052/4885ALDH1A1 138/4885CES2 50/4885
US-20200369590-A1 PROCESS FOR THE MANUFACTURING OF A COMPOUND COMPRISING A (METH)ACRYLOYL GROUP ADH5, ALKBH3, METTL3 ELANE 2052/4885ALDH1A1 138/4885CES2 50/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.