SCHEMBL18898050

SCHEMBL18898050

CCC(C)(I)C(=O)Oc1c(Oc2ccc3c(O)ccc(OC(=O)C(C)(I)CC)c3c2)ccc2ccccc12

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PTGS2 P35354 2/20 0.35
▸ EGLN2 Q96KS0 1/20 0.34
▸ EGLN1 Q9GZT9 1/20 0.34
▸ ALOX5 P09917 1/20 0.33
▸ NPC1 O15118 2/20 0.33
▸ KDM4E B2RXH2 2/20 0.33
▸ IDO1 P14902 1/20 0.33
▸ GAA P10253 2/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ NCEH1 Q6PIU2 1/20 0.32
▸ GLA P06280 3/20 0.32
▸ MAPT P10636 2/20 0.32
▸ ALDH1A1 P00352 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ PPARG P37231 1/20 0.32
▸ PPARA Q07869 1/20 0.32
▸ HSP90AA1 P07900 1/20 0.32
▸ SMN1; SMN2 Q16637 2/20 0.32
▸ RAB9A P51151 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18671905 0.80 ESR1 (0.42) IDO1GAAMEN1KMT2AMAPT
SCHEMBL18671978 0.75 LCK (0.36) KDM4EGAAMEN1KMT2AMAPT
SCHEMBL18671924 0.74 ALDH1A1 (0.51) KDM4EGAAMEN1KMT2AALDH1A1
SCHEMBL18671915 0.74 ALDH1A1 (0.38) KDM4EGAAMEN1KMT2AGLA
SCHEMBL20215399 0.73 ESR1 (0.32) PTGS2EGLN2EGLN1GAAMEN1
SCHEMBL18671983 0.73 ESR1 (0.49) GAAMEN1KMT2AMAPTALDH1A1
SCHEMBL20215426 0.71 NQO2 (0.43) ALOX5KDM4EGAAMEN1KMT2A
SCHEMBL18898015 0.71 ESR1 (0.38) ALOX5NPC1KDM4EGAAMEN1
SCHEMBL18671838 0.71 ALDH1A1 (0.38) NPC1KDM4EGAAMEN1KMT2A
SCHEMBL18671922 0.70 KMT2A (0.47) PTGS2NPC1KDM4EGAAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9989847-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-05 — — US disclosed
US-9665002-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-30 — — US disclosed
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