SCHEMBL18903282

SCHEMBL18903282

CNC(=O)c1ccccc1S(=O)O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.53
PLK1 P53350 2/20 0.50
ALDH1A1 P00352 2/20 0.41
TDP1 Q9NUW8 1/20 0.41
BRD4 O60885 3/20 0.40
KAT2B Q92831 1/20 0.40
BAZ2B Q9UIF8 1/20 0.40
BRD2 P25440 1/20 0.40
BRD3 Q15059 1/20 0.40
BRDT Q58F21 1/20 0.40
SLC6A2 P23975 1/20 0.40
SLC6A4 P31645 1/20 0.40
SLC6A3 Q01959 1/20 0.40
POLB P06746 1/20 0.40
ADRA1D P25100 1/20 0.39
ADRA1A P35348 1/20 0.39
ADRA1B P35368 1/20 0.39
MAPK10 P53779 1/20 0.38
PDK2 Q15119 1/20 0.38
MTNR1A P48039 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13758110 0.80 GAA (0.49) GAAPLK1ALDH1A1TDP1BRD4
SCHEMBL2344909 0.79 GAA (0.71) GAAPLK1ALDH1A1BRD4KAT2B
SCHEMBL28007602 0.78 ALDH1A1 (0.44) ALDH1A1TDP1BRD4POLB
SCHEMBL11065639 0.77 LMNA (0.55) GAAALDH1A1SLC6A4SLC6A3POLB
SCHEMBL2778596 0.75 ALDH1A1 (0.60) ALDH1A1TDP1POLB
SCHEMBL14124798 0.74 AKR1C3 (0.55) GAAALDH1A1TDP1
SCHEMBL29084161 0.74 ALDH1A1 (0.50) GAAALDH1A1TDP1POLB
SCHEMBL26213652 0.74 ALDH1A1 (0.40) ALDH1A1TDP1POLB
SCHEMBL28114260 0.74 ALDH1A1 (0.58) ALDH1A1TDP1POLB
SCHEMBL11410287 0.73 GAA (0.63) GAAPLK1ALDH1A1BRD4KAT2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1566693-B1 Use of a Resist Composition for Immersion Exposure and Pattern Formation Method Using the Composition FUJIFILM CORP (JP) 2018-05-23 EP disclosed
EP-2090932-B1 Positive resist composition for use with electron beam, X-ray or EUV and pattern forming method using the same FUJIFILM CORP (JP) 2017-05-31 EP disclosed