SCHEMBL18905262

SCHEMBL18905262

CCCC(O)c1ccc(OC[SiH3])cc1

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
ALDH1A1 P00352 2/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
AOC3 Q16853 2/20 0.38
SLC2A1 P11166 2/20 0.37
GAA P10253 1/20 0.37
DRD2 P14416 1/20 0.36
HTR2A P28223 1/20 0.36
HRH1 P35367 1/20 0.36
TAS1R3 Q7RTX0 1/20 0.36
TAS1R1 Q7RTX1 1/20 0.36
TAAR1 Q96RJ0 1/20 0.36
MAPT P10636 1/20 0.36
HTT P42858 1/20 0.36
TSHR P16473 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6055165 0.85 MEN1 (0.59) MEN1KMT2AALDH1A1SMN1; SMN2DRD2
SCHEMBL18905282 0.85 LMNA (0.50) MEN1KMT2AALDH1A1SMN1; SMN2AOC3
SCHEMBL18905429 0.85 SLC2A1 (0.44) MEN1KMT2AALDH1A1SMN1; SMN2SLC2A1
SCHEMBL21633858 0.80 LMNA (0.48) MEN1KMT2AALDH1A1SMN1; SMN2AOC3
SCHEMBL5488204 0.79 AOC3 (0.58) ALDH1A1AOC3GAATAS1R3TAS1R1
SCHEMBL18905256 0.77 ALDH1A1 (0.40) MEN1KMT2AALDH1A1TSHR
SCHEMBL17937331 0.77 MEN1 (0.45) MEN1KMT2AALDH1A1SMN1; SMN2SLC2A1
SCHEMBL18905454 0.77 LMNA (0.41) MEN1KMT2AALDH1A1SMN1; SMN2AOC3
SCHEMBL6055472 0.76 MEN1 (0.57) MEN1KMT2ASMN1; SMN2SLC2A1DRD2
SCHEMBL6055383 0.76 KMT2A (0.43) MEN1KMT2AALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170154766-A1 SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-01 US disclosed