SCHEMBL18905531

SCHEMBL18905531

CC/C=C\c1ccc(OC[SiH3])cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RELA Q04206 1/20 0.47
▸ ESR1 P03372 2/20 0.42
▸ AHR P35869 2/20 0.42
▸ RAB9A P51151 2/20 0.41
▸ CYP1A2 P05177 2/20 0.41
▸ CYP3A4 P08684 1/20 0.41
▸ THPO P40225 1/20 0.41
▸ HIF1A Q16665 1/20 0.41
▸ MTOR P42345 1/20 0.41
▸ SMN1; SMN2 Q16637 2/20 0.40
▸ KDM4E B2RXH2 2/20 0.40
▸ ALDH1A1 P00352 2/20 0.40
▸ TP53 P04637 2/20 0.40
▸ MAPT P10636 2/20 0.40
▸ GMNN O75496 1/20 0.40
▸ LMNA P02545 1/20 0.40
▸ BLM P54132 1/20 0.40
▸ PMP22 Q01453 1/20 0.40
▸ NPC1 O15118 1/20 0.40
▸ PTGS2 P35354 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18911081 0.84 RELA (0.66) RELAESR1AHRRAB9ASMN1; SMN2
SCHEMBL8986278 0.84 RELA (0.66) RELAESR1AHRRAB9ASMN1; SMN2
SCHEMBL9133264 0.84 RELA (0.66) RELAESR1AHRRAB9ASMN1; SMN2
SCHEMBL18905559 0.84 AHR (0.47) RELAAHRCYP1A2KDM4EALDH1A1
SCHEMBL18905392 0.80 ALDH1A1 (0.57) RELAESR1AHRRAB9ACYP1A2
SCHEMBL256708 0.78 KDM4E (0.59) RELAESR1AHRRAB9ACYP1A2
SCHEMBL8647769 0.78 KDM4E (0.59) RELAESR1AHRRAB9ACYP1A2
SCHEMBL12047534 0.78 KDM4E (0.59) RELAESR1AHRRAB9ACYP1A2
SCHEMBL13778032 0.73 KDM4E (0.53) RELAESR1AHRRAB9ACYP1A2
SCHEMBL14604958 0.73 LTA4H (0.52) RELARAB9ACYP1A2CYP3A4THPO

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170154766-A1 SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-01 — — US disclosed
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