Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCA | P17252 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26085386 | 1.00 | PRKCA (0.39) | PRKCA | |
| SCHEMBL21367461 | 0.88 | — | — | |
| SCHEMBL26379738 | 0.85 | PRKCA (0.30) | PRKCA | |
| SCHEMBL25704843 | 0.84 | PRKCA (0.39) | PRKCA | |
| SCHEMBL23420071 | 0.82 | PRKCA (0.31) | PRKCA | |
| SCHEMBL25803800 | 0.78 | PRKCA (0.60) | PRKCA | |
| SCHEMBL21135616 | 0.74 | EPHX2 (0.31) | — | |
| SCHEMBL24360864 | 0.74 | PRKCA (0.43) | PRKCA | |
| SCHEMBL22517134 | 0.70 | NPSR1 (0.43) | PRKCA | |
| SCHEMBL19719269 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11822240-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11703757-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |
| US-11693316-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| US-11635686-B2 | Resist composition, method of forming resist pattern, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-04-25 | — | — | US | disclosed |
| US-20220411727-A1 | CLEANING COMPOSITION, METHOD OF CLEANING COATING FILM FORMING DEVICE, METHOD OF PRODUCING SUBSTRATE FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-12-29 | — | — | US | disclosed |
| US-20220206384-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-06-30 | — | — | US | disclosed |
| US-20220179306-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-06-09 | — | — | US | disclosed |
| US-20220107565-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-07 | — | — | US | disclosed |
| US-20220011666-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-01-13 | — | — | US | disclosed |
| US-11221557-B2 | Resist composition, method of forming resist pattern, compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-01-11 | — | — | US | disclosed |
| US-20200159119-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-05-21 | — | — | US | disclosed |
| US-20190354011-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-11-21 | — | — | US | disclosed |
| US-10414918-B2 | Method of preparing polymer compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-09-17 | — | — | US | disclosed |
| US-10394122-B2 | Resist composition, method for forming resist pattern, compound, and acid generator | TOYKO OHKA KOGYO CO., LTD. (JP) | 2019-08-27 | — | — | US | disclosed |
| US-20190196329-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-06-27 | — | — | US | disclosed |
| US-10241406-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-03-26 | — | — | US | disclosed |
| US-20180022916-A1 | METHOD OF PREPARING POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-9690194-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-27 | — | — | US | disclosed |
| US-9682951-B2 | Resist composition, method of forming resist pattern, acid generator, photoreactive quencher, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-20 | — | — | US | disclosed |
| US-9671690-B2 | Resist composition, method for forming resist pattern, photo-reactive quencher and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10241406-B2 | Resist composition and method for forming resist pattern | RB1, CHD1, SMARCA1 | PRKCA 3733/4885 |
| US-11635686-B2 | Resist composition, method of forming resist pattern, and compound | FXR1, HNRNPA1, RBM3 | PRKCA 4552/4885 |
| US-10394122-B2 | Resist composition, method for forming resist pattern, compound, and acid generator | RB1, FXR1, CCNA1 | PRKCA 2391/4885 |
| US-11221557-B2 | Resist composition, method of forming resist pattern, compound, and acid generator | RER1, GRM1, RRS1 | PRKCA 4206/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.