SCHEMBL1896072

SCHEMBL1896072

C=Cc1ccccc1C(=O)OC(C)Cl

nearest known ligand 0.38

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.38
ALDH1A1 P00352 4/20 0.38
TSHR P16473 2/20 0.38
CYP3A4 P08684 1/20 0.38
DHODH Q02127 2/20 0.35
LMNA P02545 1/20 0.35
USP2 O75604 1/20 0.35
KMT2A Q03164 2/20 0.34
ADRB2 P07550 2/20 0.34
ADRB1 P08588 2/20 0.34
ADRB3 P13945 2/20 0.34
HSD17B10 Q99714 1/20 0.33
BACE1 P56817 1/20 0.33
SCN1A P35498 1/20 0.33
SCN2A Q99250 1/20 0.33
SCN3A Q9NY46 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29030417 0.87 ALDH1A1 (0.40) NPC1ALDH1A1TSHRCYP3A4DHODH
SCHEMBL820636 0.87 NPC1 (0.50) NPC1ALDH1A1TSHRCYP3A4DHODH
SCHEMBL1895797 0.83 NPC1 (0.37) NPC1ALDH1A1TSHRCYP3A4DHODH
SCHEMBL11724701 0.82 TSHR (0.52) NPC1ALDH1A1TSHRCYP3A4LMNA
SCHEMBL1897705 0.81 NPC1 (0.39) NPC1ALDH1A1TSHRCYP3A4DHODH
SCHEMBL1899945 0.79 CYP3A4 (0.37) NPC1ALDH1A1TSHRCYP3A4DHODH
SCHEMBL1899421 0.79 NPC1 (0.35) NPC1ALDH1A1TSHRCYP3A4DHODH
SCHEMBL1897725 0.79 TSHR (0.40) NPC1ALDH1A1TSHRCYP3A4LMNA
SCHEMBL1896552 0.78 ALDH1A1 (0.46) NPC1ALDH1A1TSHRCYP3A4KMT2A
SCHEMBL61520 0.78 TSHR (0.55) ALDH1A1TSHRLMNAKMT2AHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US disclosed