SCHEMBL1897725

SCHEMBL1897725

C=Cc1ccccc1C(=O)OC(C)OCC

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.40
ALDH1A1 P00352 5/20 0.37
CYP3A4 P08684 1/20 0.37
SCN1A P35498 1/20 0.36
SCN2A Q99250 1/20 0.36
SCN3A Q9NY46 1/20 0.36
HSD17B10 Q99714 1/20 0.36
NPC1 O15118 1/20 0.35
LMNA P02545 3/20 0.35
USP2 O75604 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
KMT2A Q03164 2/20 0.34
KDM4E B2RXH2 2/20 0.34
MEN1 O00255 1/20 0.34
PLIN1 O60240 1/20 0.34
POLB P06746 1/20 0.34
MAPT P10636 1/20 0.34
PLIN5 Q00G26 1/20 0.34
ABHD5 Q8WTS1 1/20 0.34
HPGD P15428 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1902387 0.89 ALDH1A1 (0.43) TSHRALDH1A1CYP3A4SCN1ASCN2A
SCHEMBL1896552 0.87 ALDH1A1 (0.46) TSHRALDH1A1CYP3A4SCN1ASCN2A
SCHEMBL1899451 0.87 TSHR (0.46) TSHRALDH1A1CYP3A4HSD17B10LMNA
SCHEMBL5042420 0.85 TSHR (0.55) TSHRALDH1A1CYP3A4SCN1ASCN2A
SCHEMBL1896761 0.84 TSHR (0.39) TSHRALDH1A1CYP3A4SCN1ASCN2A
SCHEMBL1895797 0.84 NPC1 (0.37) TSHRALDH1A1CYP3A4SCN1ASCN2A
SCHEMBL1897090 0.83 ALDH1A1 (0.39) TSHRALDH1A1CYP3A4SCN1ASCN2A
SCHEMBL21112025 0.83 TSHR (0.38) TSHRALDH1A1CYP3A4SCN1ASCN2A
SCHEMBL1897705 0.82 NPC1 (0.39) TSHRALDH1A1CYP3A4SCN1ASCN2A
SCHEMBL820636 0.82 NPC1 (0.50) TSHRALDH1A1CYP3A4HSD17B10NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US claimed
US-20210024674-A1 POLYMER COMPOUND, COMPOSITION, INSULATING LAYER, AND ORGANIC THIN FILM TRANSISTOR SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-01-28 US disclosed
US-10676554-B2 Polymer compound, film obtained by hardening this polymer compound and electronic device comprising this film SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-06-09 US disclosed
US-20190211123-A1 POLYMER COMPOUND, FILM OBTAINED BY HARDENING THIS POLYMER COMPOUND AND ELECTRONIC DEVICE COMPRISING THIS FILM SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-07-11 US disclosed
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US disclosed