Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRPA1 | O75762 | 2/20 | 0.38 |
| ▸ | MAOB | P27338 | 1/20 | 0.38 |
| ▸ | IDO1 | P14902 | 2/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | CMA1 | P23946 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | HPGD | P15428 | 2/20 | 0.36 |
| ▸ | EGFR | P00533 | 1/20 | 0.36 |
| ▸ | USP2 | O75604 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | CHAT | P28329 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1934370 | 0.81 | CYP2C19 (0.38) | MAOBCYP2C19MEN1KMT2AKDM4E | |
| SCHEMBL7207745 | 0.80 | TDP1 (0.33) | TRPA1MAOBIDO1CYP2C19MEN1 | |
| SCHEMBL6419016 | 0.80 | IDO1 (0.42) | IDO1MEN1KMT2AKDM4ERELA | |
| SCHEMBL10682846 | 0.79 | MAOB (0.44) | TRPA1MAOBCYP2C19MEN1KMT2A | |
| SCHEMBL770392 | 0.79 | MAOB (0.44) | TRPA1MAOBCYP2C19MEN1KMT2A | |
| SCHEMBL456141 | 0.74 | TRPA1 (0.44) | TRPA1MAOBCYP2C19CMA1MEN1 | |
| SCHEMBL9699570 | 0.74 | TRPA1 (0.53) | TRPA1CYP2C19MEN1KMT2AKDM4E | |
| SCHEMBL19548024 | 0.73 | RELA (0.43) | TRPA1MAOBIDO1CYP2C19MEN1 | |
| SCHEMBL7395928 | 0.73 | IDO1 (0.55) | MAOBIDO1MEN1KMT2AHSD17B10 | |
| SCHEMBL2598224 | 0.73 | MAOB (0.47) | MAOBIDO1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1853327-B1 | MEDICAL DEVICES HAVING POLYMERIC REGIONS WITH COPOLYMERS CONTAINING HYDROCARBON AND HETEROATOM-CONTAINING MONOMERIC SPECIES | BOSTON SCIENT LTD (BB) | 2012-11-07 | — | — | EP | claimed |
| EP-1853327-A2 | MEDICAL DEVICES HAVING POLYMERIC REGIONS WITH COPOLYMERS CONTAINING HYDROCARBON AND HETEROATOM-CONTAINING MONOMERIC SPECIES | Boston Scientific Limited (BB) | 2007-11-14 | — | — | EP | claimed |
| WO-2006083628-A2 | MEDICAL DEVICES HAVING POLYMERIC REGIONS WITH COPOLYMERS CONTAINING HYDROCARBON AND HETEROATOM-CONTAINING MONOMERIC SPECIES | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2006-08-10 | — | — | WO | claimed |
| US-20060171981-A1 | Medical devices having polymeric regions with copolymers containing hydrocarbon and heteroatom-containing monomeric species | BOSTON SCIENTIFIC SCIMED, INC. | 2006-08-03 | — | — | US | claimed |
| US-5914219-A | Radiation-sensitive mixture and the production of relief structures having improved contrast | BASF AKTIENGESELLSCHAFT (DE) | 1999-06-22 | — | — | US | claimed |
| EP-0616258-B1 | Radiation sensitive composition and process for forming relief structures with improved contrast | BASF AG (DE) | 1997-05-21 | — | — | EP | claimed |
| EP-0616258-A1 | Radiation sensitive composition and process for forming relief structures with improved contrast | BASF Aktiengesellschaft (DE) | 1994-09-21 | — | — | EP | claimed |
| WO-2024066848-A1 | HIGH-MOLECULAR-WEIGHT NARROW-DISTRIBUTION PHS RESIN, AND PREPARATION METHOD THEREFOR AND USE THEREOF | 上海八亿时空先进材料有限公司 | 2024-04-04 | — | — | WO | disclosed |
| WO-2024020780-A1 | STAR-SHAPED POLYMER, PAINT, COATING, AND METHOD FOR PRODUCING STAR-SHAPED POLYMER | DIC CORPORATION (JP) | 2024-02-01 | — | — | WO | disclosed |
| WO-2022236548-A1 | STAR POLYMER, COATING MATERIAL, COATING FILM, AND METHOD FOR PRODUCING STAR POLYMER | DIC CORPORATION (JP) | 2022-11-17 | — | — | WO | disclosed |
| US-20180211828-A1 | COMPOSITION FOR FORMING FILM FOR USE IN CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD FOR SEMICONDUCTOR SUBSTRATE | JSR CORPORATION (JP) | 2018-07-26 | — | — | US | disclosed |
| US-8992512-B2 | Medical devices having polymeric regions with copolymers containing hydrocarbon and heteroatom-containing monomeric species | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2015-03-31 | — | — | US | disclosed |
| EP-1853327-B1 | MEDICAL DEVICES HAVING POLYMERIC REGIONS WITH COPOLYMERS CONTAINING HYDROCARBON AND HETEROATOM-CONTAINING MONOMERIC SPECIES | BOSTON SCIENT LTD (BB) | 2012-11-07 | — | — | EP | disclosed |
| US-5362597-A | Lenses | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-11-08 | — | — | US | disclosed |
| EP-0616258-A1 | Radiation sensitive composition and process for forming relief structures with improved contrast | BASF Aktiengesellschaft (DE) | 1994-09-21 | — | — | EP | disclosed |
| EP-0605856-A2 | Process for the manufacture of p-hydroxystyrene polymers and use thereof | BASF Aktiengesellschaft (DE) | 1994-07-13 | — | — | EP | disclosed |
| EP-0520626-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-12-30 | — | — | EP | disclosed |
| EP-0277555-B1 | COPOLYMERS WITH 0-NITROCARBINOL ESTER GROUPS, AND PROCESS FOR PREPARING TWO-LAYER RESISTS AND SEMICONDUCTOR DEVICES | BASF Aktiengesellschaft (DE) | 1992-04-08 | — | — | EP | disclosed |
| US-4808682-A | BLEND WITH OLEFINICALLY UNSATURATED SILICON COMPOUND | BASF AKTIENGESELLSCHAFT (DE) | 1989-02-28 | — | — | US | disclosed |
| EP-0277555-A2 | Copolymers with 0-nitrocarbinol ester groups, and process for preparing two-layer resists and semiconductor devices | BASF Aktiengesellschaft (DE) | 1988-08-10 | — | — | EP | disclosed |