Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB | P27338 | 1/20 | 0.44 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | CHAT | P28329 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | RELA | Q04206 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.39 |
| ▸ | CYP11B1 | P15538 | 1/20 | 0.39 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.39 |
| ▸ | GLA | P06280 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | GRM5 | P41594 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | GRM4 | Q14833 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8996779 | 0.90 | ALOX15 (0.39) | MAOBTRPA1MEN1KMT2AALOX15 | |
| SCHEMBL10682846 | 0.86 | MAOB (0.44) | MAOBTRPA1MEN1KMT2AALOX15 | |
| SCHEMBL456141 | 0.81 | TRPA1 (0.44) | MAOBTRPA1MEN1KMT2AALOX15 | |
| SCHEMBL8491011 | 0.80 | NPC1 (0.48) | MEN1KMT2AALOX15ALDH1A1KDM4E | |
| SCHEMBL1899986 | 0.79 | TRPA1 (0.38) | MAOBTRPA1MEN1KMT2AALOX15 | |
| SCHEMBL19548024 | 0.79 | RELA (0.43) | MAOBTRPA1MEN1KMT2AALOX15 | |
| SCHEMBL8386348 | 0.78 | NFE2L2 (0.48) | TRPA1NFE2L2 | |
| SCHEMBL7541641 | 0.78 | TRPA1 (0.45) | MAOBTRPA1MEN1KMT2AALOX15 | |
| SCHEMBL8488639 | 0.78 | AHR (0.43) | MAOBMEN1KMT2AALDH1A1KDM4E | |
| SCHEMBL5888604 | 0.77 | RELA (0.44) | MAOBTRPA1MEN1KMT2AALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 181 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1733211-A4 | PROCESSABLE MOLECULARLY IMPRINTED POLYMERS | UNIV JOHNS HOPKINS (US) | 2007-05-30 | — | — | EP | claimed |
| EP-1733211-A1 | PROCESSABLE MOLECULARLY IMPRINTED POLYMERS | THE JOHNS-HOPKINS UNIVERSITY (US) | 2006-12-20 | — | — | EP | claimed |
| WO-2005108473-A1 | SEMICONDUCTOR NANOPARTICLE-ENCAPSULATING VINYL POLYMER, VINYL POLYMER MIXTURE INCLUDINGTHE SAME, AND PROCESS OF PREPARING THE SAME | SEOUL NATIONAL UNIVERSITY INDUSTRY FOUNDATION (KR) | 2005-11-17 | — | — | WO | claimed |
| WO-2005103655-A1 | PROCESSABLE MOLECULARLY IMPRINTED POLYMERS | THE JOHNS HOPKINS UNIVERSITY (US) | 2005-11-03 | — | — | WO | claimed |
| US-5914219-A | Radiation-sensitive mixture and the production of relief structures having improved contrast | BASF AKTIENGESELLSCHAFT (DE) | 1999-06-22 | — | — | US | claimed |
| EP-0616258-B1 | Radiation sensitive composition and process for forming relief structures with improved contrast | BASF AG (DE) | 1997-05-21 | — | — | EP | claimed |
| EP-0605856-B1 | Process for the manufacture of p-hydroxystyrene polymers and use thereof | BASF AG (DE) | 1996-08-28 | — | — | EP | claimed |
| EP-0616258-A1 | Radiation sensitive composition and process for forming relief structures with improved contrast | BASF Aktiengesellschaft (DE) | 1994-09-21 | — | — | EP | claimed |
| WO-2024020780-A1 | STAR-SHAPED POLYMER, PAINT, COATING, AND METHOD FOR PRODUCING STAR-SHAPED POLYMER | DIC CORPORATION (JP) | 2024-02-01 | — | — | WO | disclosed |
| CN-115997158-A | Ophthalmic lens | 株式会社目立康 | 2023-04-21 | — | — | CN | disclosed |
| WO-2023056310-A1 | MOLECULARLY IMPRINTED POLYMER COATINGS AND SENSORS FOR BIODETECTION | 6th Wave Innovations Corp. (US) | 2023-04-06 | — | — | WO | disclosed |
| WO-2022236548-A1 | STAR POLYMER, COATING MATERIAL, COATING FILM, AND METHOD FOR PRODUCING STAR POLYMER | DIC CORPORATION (JP) | 2022-11-17 | — | — | WO | disclosed |
| CN-107229185-B | Energy-sensitive composition, cured product, and method for producing cured product | 东京应化工业株式会社 | 2022-04-15 | — | — | CN | disclosed |
| CN-114051497-A | Chromene compound and photochromic optical article | 株式会社德山 | 2022-02-15 | — | — | CN | disclosed |
| EP-0277555-B1 | COPOLYMERS WITH 0-NITROCARBINOL ESTER GROUPS, AND PROCESS FOR PREPARING TWO-LAYER RESISTS AND SEMICONDUCTOR DEVICES | BASF Aktiengesellschaft (DE) | 1992-04-08 | — | — | EP | disclosed |
| EP-0464614-A2 | A composition having sensitivity to light or radiation | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1992-01-08 | — | — | EP | disclosed |
| US-5073474-A | Organic compound containing acid cleavable group(s) which also forms strong acid on irradiation, positive-working | BASF AKTIENGESELLSCHAFT (DE) | 1991-12-17 | — | — | US | disclosed |
| CN-1049660-A | Aminoketone derivative and application thereof | MITZUI TOATSU CHEMICALS INC (JP) | 1991-03-06 | — | — | CN | disclosed |
| US-4808682-A | BLEND WITH OLEFINICALLY UNSATURATED SILICON COMPOUND | BASF AKTIENGESELLSCHAFT (DE) | 1989-02-28 | — | — | US | disclosed |
| EP-0277555-A2 | Copolymers with 0-nitrocarbinol ester groups, and process for preparing two-layer resists and semiconductor devices | BASF Aktiengesellschaft (DE) | 1988-08-10 | — | — | EP | disclosed |