SCHEMBL19012575

SCHEMBL19012575

C=C(C)C(=O)OCCOC(C)(Cc1ccccc1)OCC(C)C

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.43
TDP1 Q9NUW8 2/20 0.36
POLB P06746 1/20 0.36
APEX1 P27695 1/20 0.36
HTT P42858 1/20 0.36
THRB P10828 1/20 0.35
ALDH1A1 P00352 4/20 0.35
TRPA1 O75762 1/20 0.34
RECQL P46063 1/20 0.34
MMP8 P22894 1/20 0.34
CTSL P07711 1/20 0.33
CTSS P25774 1/20 0.33
CTSK P43235 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CHRNB2 P17787 1/20 0.33
CHRNB4 P30926 1/20 0.33
CHRNA3 P32297 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10590010 0.91 THRB (0.41) TSHRTDP1POLBAPEX1HTT
SCHEMBL19012588 0.88 THRB (0.42) TSHRTDP1POLBAPEX1HTT
SCHEMBL28388697 0.81 ADRB2 (0.41) TSHRALDH1A1TRPA1RECQLMMP8
SCHEMBL19000950 0.81 TSHR (0.39) TSHRTDP1POLBAPEX1HTT
SCHEMBL42893 0.73 HCAR2 (0.51) TSHRTDP1POLBAPEX1HTT
SCHEMBL23853845 0.73 ADRB2 (0.42) TSHRALDH1A1TRPA1RECQLMMP8
SCHEMBL17216232 0.72 TSHR (0.54) TSHRTDP1POLBAPEX1HTT
Methane SCHEMBL4468486 0.72 HCAR2 (0.50) TSHRTDP1POLBAPEX1HTT
SCHEMBL115658 0.71 KIF11 (0.46) TSHRTDP1POLBAPEX1HTT
Methacrylic Acid SCHEMBL8131805 0.70 HCAR2 (0.49) TSHRTDP1POLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9758610-B2 Acid-labile hyperbranched copolymer and associated photoresist composition and method of forming an electronic device DOW GLOBAL TECHNOLOGIES LLC (US) 2017-09-12 US disclosed
US-20170174808-A1 ACID-LABILE HYPERBRANCHED COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION AND METHOD OF FORMING AN ELECTRONIC DEVICE DOW GLOBAL TECHNOLOGIES LLC 2017-06-22 US disclosed