Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | EDNRA | P25101 | 2/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | HSPA1A | P0DMV8 | 1/20 | 0.36 |
| ▸ | PTPN7 | P35236 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 2/20 | 0.34 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.34 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.33 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.33 |
| ▸ | HTR2A | P28223 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | EDNRB | P24530 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | RBP4 | P02753 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29405961 | 1.00 | ALDH1A1 (0.40) | ALDH1A1EDNRATDP1ATMHSPA1A | |
| SCHEMBL4943541 | 1.00 | ALDH1A1 (0.40) | ALDH1A1EDNRATDP1ATMHSPA1A | |
| SCHEMBL5320052 | 0.87 | HTR2A (0.34) | ALDH1A1TDP1ATMHSPA1APTPN7 | |
| SCHEMBL1025069 | 0.86 | ATM (0.40) | ALDH1A1ATMPOLBTSHR | |
| 4-Hydroxybenzaldehyde SCHEMBL28936869 | 0.85 | ALDH5A1 (0.43) | ALDH1A1TDP1 | |
| SCHEMBL642506 | 0.84 | ATM (0.37) | ALDH1A1ATMPOLBHTR2ATSHR | |
| SCHEMBL4772652 | 0.84 | HTR2A (0.32) | ALDH1A1ATMPOLBPTGDR2HTR2A | |
| SCHEMBL5697727 | 0.84 | NOTUM (0.37) | ALDH1A1ATMPOLBHTR2ATSHR | |
| SCHEMBL31245687 | 0.84 | ATM (0.37) | ALDH1A1ATMPOLBHTR2ATSHR | |
| SCHEMBL29053325 | 0.80 | ALDH1A1 (0.32) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170242338-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-08-24 | — | — | US | disclosed |
| US-20170176858-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2017-06-22 | — | — | US | disclosed |