Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 1/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.44 |
| ▸ | NAAA | Q02083 | 3/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.35 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.35 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.35 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.35 |
| ▸ | GBA1 | P04062 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9128366 | 1.00 | NPC1 (0.48) | NPC1CYP1A2NAAASMN1; SMN2TSHR | |
| SCHEMBL6378525 | 1.00 | NPC1 (0.48) | NPC1CYP1A2NAAASMN1; SMN2TSHR | |
| SCHEMBL27915053 | 1.00 | NPC1 (0.48) | NPC1CYP1A2NAAASMN1; SMN2TSHR | |
| SCHEMBL6379896 | 1.00 | NPC1 (0.48) | NPC1CYP1A2NAAASMN1; SMN2TSHR | |
| SCHEMBL11940413 | 1.00 | NPC1 (0.48) | NPC1CYP1A2NAAASMN1; SMN2TSHR | |
| SCHEMBL191351 | 0.98 | NPC1 (0.45) | NPC1CYP1A2NAAASMN1; SMN2TSHR | |
| SCHEMBL677762 | 0.93 | NAAA (0.47) | NPC1CYP1A2NAAAEPHX1EPHX2 | |
| SCHEMBL11836350 | 0.93 | NAAA (0.47) | NPC1CYP1A2NAAAEPHX1EPHX2 | |
| SCHEMBL2606649 | 0.93 | — | — | |
| Ethylene Glycol SCHEMBL27967552 | 0.92 | TSHR (0.45) | NPC1CYP1A2NAAASMN1; SMN2TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 611 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12631966-B2 | Method for forming photoresist patterns | SAMSUNG SDI CO., LTD. (KR) | 2026-05-19 | — | — | US | claimed |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-03-31 | — | — | US | claimed |
| US-12554199-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-02-17 | — | — | US | claimed |
| CN-120199901-A | Weak polarity organic solvent for halogen-containing solid electrolyte, and preparation method and application thereof | 深圳市固易能科技有限责任公司 | 2025-06-24 | — | — | CN | claimed |
| CN-118496077-A | Process for producing cyclohexanone | 中国石油化工股份有限公司 | 2024-08-16 | — | — | CN | claimed |
| CN-114315522-B | Purification method of cyclohexanol and preparation method of cyclohexanone | 昌德新材科技股份有限公司 | 2024-02-13 | — | — | CN | claimed |
| US-20230024422-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230026721-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230021469-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230028244-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20050106494-A1 | Silicon-containing resist systems with cyclic ketal protecting groups | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-05-19 | — | — | US | claimed |
| US-6197366-B1 | ELECTROCONDUCTIVE METAL FILM FROM LOW TEMPERATURE BAKING FROMNITRATE SALT AND CYANO COMPOUND, CARBONYL COMPOUND OR ORGANIC SALT OF METAL AND AMINO | TAKAMATSU RESEARCH LABORATORY (JP) | 2001-03-06 | — | — | US | claimed |
| US-6111146-A | REACTING PHENOL WITH ALKYLENE OXIDE TO ALKOXYLATE, HYDROGENATING IN PRESENCE OF CATALYST | PCC CHEMAX, INC. | 2000-08-29 | — | — | US | claimed |
| EP-0989205-A1 | METAL PASTE AND METHOD FOR PRODUCTION OF METAL FILM | Takamatsu Research Laboratory (JP) | 2000-03-29 | — | — | EP | claimed |
| US-6043003-A | SOME OF THE POLAR FUNCTIONAL GROUPS OF THE AQUEOUS BASE SOLUBLE POLYMER OR COPOLYMERS ARE PROTECTED WITH A CYCLIC ALIPHATIC KETAL PROTECTING GROUP SUCH AS METHOXYCYCLOHEXANYL. | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-28 | — | — | US | claimed |
| US-6037097-A | A CYCLIC ALIPHATIC KETAL SUBSTITUENT E.G. METHOXYCYCLOHEXANYL AS AN ACID-LABILE PROTECTING GROUP FOR AN AQUEOUS BASE SOLUBLE POLYMER, E.G. A POLYHYDROXYSTYRENE; SHELF-LIFE; VACUUM STABILITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-14 | — | — | US | claimed |
| EP-0932082-A2 | Chemically amplified resist composition and method of creating a patterned resist using electron beam | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-07-28 | — | — | EP | claimed |
| EP-0680977-B1 | Copolymers containing hydroxyl and carboxyl groups, their preparation and their use in high solid coatings | HOECHST AG (DE) | 1998-04-01 | — | — | EP | claimed |
| CN-1147499-A | Process for the preparation of cyclohexanol and cyclohexanone | XIAO ZAOSHENG (CN) | 1997-04-16 | — | — | CN | claimed |
| US-4990688-A | Extraction from a mixture containing an aromatic sulfonic acid using an ether/phenol extractant | BASF AKTIENGESELLSCHAFT (DE) | 1991-02-05 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230024422-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | TOP1, TOP2A, FTO | NPC1 3297/4885CYP1A2 1869/4885NAAA 2403/4885 |
| US-12631966-B2 | Method for forming photoresist patterns | FTO, SOAT1, SOAT2 | NPC1 2108/4885CYP1A2 210/4885NAAA 3406/4885 |
| US-12554199-B2 | Resist topcoat composition, and method of forming patterns using the composition | FGFR2, FGFR1, FDFT1 | NPC1 2156/4885CYP1A2 228/4885NAAA 3006/4885 |
| US-20230021469-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | COL2A1, TOP1, TOP2A | NPC1 3186/4885CYP1A2 1087/4885NAAA 2660/4885 |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | RER1, TOP1, RRS1 | NPC1 1460/4885CYP1A2 1048/4885NAAA 3744/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.