SCHEMBL19305183

SCHEMBL19305183

CCOc1ccc2sc(-c3ccc(N(C)C)cc3)[n+](C)c2c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 4/20 0.54
SNCA P37840 3/20 0.54
TNF P01375 1/20 0.54
NOD1 Q9Y239 1/20 0.54
BCHE P06276 1/20 0.53
MEN1 O00255 1/20 0.53
NPC1 O15118 1/20 0.53
POLB P06746 1/20 0.53
RAB9A P51151 1/20 0.53
KMT2A Q03164 1/20 0.53
INSR P06213 7/20 0.39
ALDH1A1 P00352 2/20 0.38
KDM4E B2RXH2 1/20 0.38
MAPT P10636 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
MAOB P27338 1/20 0.38
GLA P06280 1/20 0.36
GAA P10253 1/20 0.36
ATM Q13315 2/20 0.35
HCRTR1 O43613 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL39299 0.99 APP (0.55) APPSNCATNFNOD1BCHE
SCHEMBL19305186 0.90 APP (0.64) APPSNCATNFNOD1BCHE
SCHEMBL19305187 0.89 SNCA (0.41) APPSNCATNFNOD1BCHE
Hydrochloric Acid SCHEMBL39077 0.89 APP (0.65) APPSNCATNFNOD1BCHE
Hydrochloric Acid SCHEMBL3410018 0.88 SNCA (0.43) APPSNCATNFNOD1BCHE
SCHEMBL19305180 0.84 INSR (0.48) APPSNCATNFNOD1BCHE
Hydrochloric Acid SCHEMBL39068 0.83 INSR (0.47) APPSNCATNFNOD1BCHE
SCHEMBL17835477 0.79 SNCA (0.50) APPSNCATNFNOD1BCHE
SCHEMBL19305182 0.79 APP (0.79) APPSNCATNFNOD1BCHE
Hydrochloric Acid SCHEMBL39254 0.78 SNCA (0.51) APPSNCATNFNOD1BCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3034654-B1 Composition and method for micro etching of copper and copper alloys ATOTECH DEUTSCHLAND GMBH (DE) 2017-10-25 EP claimed
EP-2241653-B1 Composition and method for micro etching of copper and copper alloys ATOTECH DEUTSCHLAND GMBH (DE) 2017-09-06 EP claimed