Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 2/20 | 0.38 |
| ▸ | SNCA | P37840 | 3/20 | 0.43 |
| ▸ | APP | P05067 | 2/20 | 0.43 |
| ▸ | BCHE | P06276 | 1/20 | 0.43 |
| ▸ | TNF | P01375 | 1/20 | 0.41 |
| ▸ | NOD1 | Q9Y239 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.40 |
| ▸ | MEN1 | O00255 | 5/20 | 0.40 |
| ▸ | NPC1 | O15118 | 3/20 | 0.40 |
| ▸ | RAB9A | P51151 | 3/20 | 0.40 |
| ▸ | POLB | P06746 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 5/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.34 |
| ▸ | CYP11B1 | P15538 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19305187 | 0.99 | SNCA (0.41) | SNCAAPPBCHETNFNOD1 | |
| Hydrochloric Acid SCHEMBL39254 | 0.91 | SNCA (0.51) | SNCAAPPBCHETNFNOD1 | |
| Hydrochloric Acid SCHEMBL39299 | 0.89 | APP (0.55) | SNCAAPPBCHETNFNOD1 | |
| SCHEMBL17835477 | 0.89 | SNCA (0.50) | SNCAAPPBCHETNFNOD1 | |
| SCHEMBL19305183 | 0.88 | APP (0.54) | SNCAAPPBCHETNFNOD1 | |
| Hydrochloric Acid SCHEMBL39544 | 0.85 | ALDH1A1 (0.38) | SNCAAPPBCHEKMT2AMEN1 | |
| SCHEMBL19305178 | 0.83 | MAPT (0.39) | KMT2AMEN1NPC1RAB9AMAPT | |
| Hydrochloric Acid SCHEMBL39782 | 0.83 | SNCA (0.59) | SNCAAPPBCHETNFNOD1 | |
| SCHEMBL17835478 | 0.81 | SNCA (0.58) | SNCAAPPBCHETNFNOD1 | |
| Hydrochloric Acid SCHEMBL39077 | 0.80 | APP (0.65) | SNCAAPPBCHETNFNOD1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3034654-B1 | Composition and method for micro etching of copper and copper alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2017-10-25 | — | — | EP | claimed |
| US-20170275767-A1 | COMPOSITION AND METHOD FOR MICRO ETCHING OF COPPER AND COPPER ALLOYS | ATOTECH DEUTSCHLAND GMBH (DE) | 2017-09-28 | — | — | US | claimed |
| EP-2241653-B1 | Composition and method for micro etching of copper and copper alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2017-09-06 | — | — | EP | claimed |
| EP-3034654-A1 | Composition and method for micro etching of copper and copper alloys | ATOTECH Deutschland GmbH (DE) | 2016-06-22 | — | — | EP | claimed |
| US-8758634-B2 | Composition and method for micro etching of copper and copper alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2014-06-24 | — | — | US | claimed |
| US-20130056438-A1 | COMPOSITION AND METHOD FOR MICRO ETCHING OF COPPER AND COPPER ALLOYS | ATOTECH DEUTSCHLAND GMBH (DE) | 2013-03-07 | — | — | US | claimed |
| EP-3034654-B1 | Composition and method for micro etching of copper and copper alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2017-10-25 | — | — | EP | disclosed |
| US-20170275767-A1 | COMPOSITION AND METHOD FOR MICRO ETCHING OF COPPER AND COPPER ALLOYS | ATOTECH DEUTSCHLAND GMBH (DE) | 2017-09-28 | — | — | US | disclosed |
| EP-2241653-B1 | Composition and method for micro etching of copper and copper alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2017-09-06 | — | — | EP | disclosed |
| EP-3034654-A1 | Composition and method for micro etching of copper and copper alloys | ATOTECH Deutschland GmbH (DE) | 2016-06-22 | — | — | EP | disclosed |
| US-8758634-B2 | Composition and method for micro etching of copper and copper alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2014-06-24 | — | — | US | disclosed |
| US-20130056438-A1 | COMPOSITION AND METHOD FOR MICRO ETCHING OF COPPER AND COPPER ALLOYS | ATOTECH DEUTSCHLAND GMBH (DE) | 2013-03-07 | — | — | US | disclosed |
| EP-2241653-A1 | Composition and method for micro etching of copper and copper alloys | ATOTECH Deutschland GmbH (DE) | 2010-10-20 | — | — | EP | disclosed |