Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | INSR | P06213 | 12/20 | 0.47 |
| ▸ | APP | P05067 | 2/20 | 0.44 |
| ▸ | SNCA | P37840 | 2/20 | 0.44 |
| ▸ | BCHE | P06276 | 1/20 | 0.44 |
| ▸ | TNF | P01375 | 1/20 | 0.42 |
| ▸ | NOD1 | Q9Y239 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | CHKA | P35790 | 4/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | HTT | P42858 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19305180 | 0.99 | INSR (0.48) | INSRAPPSNCABCHETNF | |
| Hydrochloric Acid SCHEMBL39544 | 0.91 | ALDH1A1 (0.38) | INSRAPPSNCABCHEMEN1 | |
| SCHEMBL19305178 | 0.89 | MAPT (0.39) | INSRMEN1NPC1RAB9AKMT2A | |
| Hydrochloric Acid SCHEMBL39637 | 0.84 | APP (0.59) | INSRAPPSNCABCHETNF | |
| Hydrochloric Acid SCHEMBL39299 | 0.84 | APP (0.55) | INSRAPPSNCABCHETNF | |
| SCHEMBL19305175 | 0.83 | APP (0.58) | INSRAPPSNCABCHETNF | |
| SCHEMBL19305183 | 0.83 | APP (0.54) | INSRAPPSNCABCHETNF | |
| Hydrochloric Acid SCHEMBL40198 | 0.83 | INSR (0.61) | INSRAPPSNCABCHETNF | |
| SCHEMBL19305173 | 0.81 | INSR (0.62) | INSRAPPSNCABCHETNF | |
| Hydrochloric Acid SCHEMBL39077 | 0.80 | APP (0.65) | INSRAPPSNCABCHETNF |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3034654-B1 | Composition and method for micro etching of copper and copper alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2017-10-25 | — | — | EP | claimed |
| US-20170275767-A1 | COMPOSITION AND METHOD FOR MICRO ETCHING OF COPPER AND COPPER ALLOYS | ATOTECH DEUTSCHLAND GMBH (DE) | 2017-09-28 | — | — | US | claimed |
| EP-2241653-B1 | Composition and method for micro etching of copper and copper alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2017-09-06 | — | — | EP | claimed |
| EP-3034654-A1 | Composition and method for micro etching of copper and copper alloys | ATOTECH Deutschland GmbH (DE) | 2016-06-22 | — | — | EP | claimed |
| US-8758634-B2 | Composition and method for micro etching of copper and copper alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2014-06-24 | — | — | US | claimed |
| US-20130056438-A1 | COMPOSITION AND METHOD FOR MICRO ETCHING OF COPPER AND COPPER ALLOYS | ATOTECH DEUTSCHLAND GMBH (DE) | 2013-03-07 | — | — | US | claimed |
| WO-2011147448-A1 | COMPOSITION AND METHOD FOR MICRO ETCHING OF COPPER AND COPPER ALLOYS | ATOTECH DEUTSCHLAND GMBH (DE) | 2011-12-01 | — | — | WO | claimed |
| EP-2241653-A1 | Composition and method for micro etching of copper and copper alloys | ATOTECH Deutschland GmbH (DE) | 2010-10-20 | — | — | EP | claimed |
| EP-3034654-B1 | Composition and method for micro etching of copper and copper alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2017-10-25 | — | — | EP | disclosed |
| US-20170275767-A1 | COMPOSITION AND METHOD FOR MICRO ETCHING OF COPPER AND COPPER ALLOYS | ATOTECH DEUTSCHLAND GMBH (DE) | 2017-09-28 | — | — | US | disclosed |
| EP-2241653-B1 | Composition and method for micro etching of copper and copper alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2017-09-06 | — | — | EP | disclosed |
| EP-3034654-A1 | Composition and method for micro etching of copper and copper alloys | ATOTECH Deutschland GmbH (DE) | 2016-06-22 | — | — | EP | disclosed |
| US-8758634-B2 | Composition and method for micro etching of copper and copper alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2014-06-24 | — | — | US | disclosed |
| US-20130056438-A1 | COMPOSITION AND METHOD FOR MICRO ETCHING OF COPPER AND COPPER ALLOYS | ATOTECH DEUTSCHLAND GMBH (DE) | 2013-03-07 | — | — | US | disclosed |
| WO-2011147448-A1 | COMPOSITION AND METHOD FOR MICRO ETCHING OF COPPER AND COPPER ALLOYS | ATOTECH DEUTSCHLAND GMBH (DE) | 2011-12-01 | — | — | WO | disclosed |
| EP-2241653-A1 | Composition and method for micro etching of copper and copper alloys | ATOTECH Deutschland GmbH (DE) | 2010-10-20 | — | — | EP | disclosed |