SCHEMBL19459487

SCHEMBL19459487

CC(C)CCCCCCc1ccncc1

nearest known ligand 0.57

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
HRH1 P35367 2/20 0.57
NAAA Q02083 1/20 0.47
CYP19A1 P11511 2/20 0.44
LOXL2 Q9Y4K0 2/20 0.43
HRH4 Q9H3N8 1/20 0.41
HRH3 Q9Y5N1 1/20 0.41
FUT7 Q11130 1/20 0.41
HIF1A Q16665 1/20 0.40
EPAS1 Q99814 1/20 0.40
LMNA P02545 1/20 0.39
HTT P42858 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
NPC1 O15118 1/20 0.39
KMT2A Q03164 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24434533 0.98 HRH1 (0.53) HRH1NAAACYP19A1LOXL2HRH4
SCHEMBL3169642 0.92 HRH1 (0.50) HRH1NAAACYP19A1LOXL2HRH4
SCHEMBL3169969 0.83 LOXL2 (0.50) HRH1CYP19A1LOXL2HRH3HIF1A
SCHEMBL2841394 0.82 HRH1 (0.77) HRH1NAAALOXL2HRH4HRH3
SCHEMBL725306 0.82 HRH1 (0.77) HRH1NAAALOXL2HRH4HRH3
SCHEMBL4413800 0.82 HRH1 (0.77) HRH1NAAALOXL2HRH4HRH3
SCHEMBL11064052 0.82 HRH1 (0.50) HRH1NAAACYP19A1LOXL2HRH4
Hydrogen Peroxide SCHEMBL29262757 0.81 GRIN2D (0.49) FUT7HIF1AEPAS1LMNA
SCHEMBL726645 0.80 HRH1 (0.73) HRH1NAAALOXL2HRH4HRH3
SCHEMBL21802444 0.79 SIGMAR1 (0.53) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10457779-B2 Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-29 US disclosed
US-20170298186-A1 TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10457779-B2 Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured film ARCN1, COL1A1, F12 HRH1 2261/4885NAAA 2533/4885CYP19A1 1623/4885
US-20170298186-A1 TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM ARCN1, COL1A1, F12 HRH1 2261/4885NAAA 2533/4885CYP19A1 1623/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.