Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2939812 | 0.98 | ALDH1A1 (0.30) | ALDH1A1L3MBTL1 | |
| SCHEMBL13721474 | 0.98 | ALDH1A1 (0.30) | ALDH1A1L3MBTL1 | |
| SCHEMBL28633862 | 0.82 | ALDH1A1 (0.31) | ALDH1A1L3MBTL1 | |
| SCHEMBL2392008 | 0.81 | ALDH1A1 (0.33) | ALDH1A1L3MBTL1 | |
| SCHEMBL24776180 | 0.80 | ALDH1A1 (0.30) | ALDH1A1L3MBTL1 | |
| SCHEMBL3139960 | 0.80 | TP53 (0.32) | ALDH1A1L3MBTL1 | |
| Ammonia Solution, Strong SCHEMBL28635838 | 0.80 | ALDH1A1 (0.30) | ALDH1A1L3MBTL1 | |
| SCHEMBL12542079 | 0.80 | — | — | |
| SCHEMBL2390460 | 0.79 | ALDH1A1 (0.32) | ALDH1A1L3MBTL1 | |
| SCHEMBL2390451 | 0.79 | ALDH1A1 (0.32) | ALDH1A1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024043121-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND AND INTERMEDIATE THEREFOR | 東京応化工業株式会社 | 2024-02-29 | — | — | WO | disclosed |
| WO-2023171670-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | 東京応化工業株式会社 | 2023-09-14 | — | — | WO | disclosed |
| US-20230132653-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230132653-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| WO-2022265034-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUNDS, INTERMEDIATE, AND COMPOUNDS | 東京応化工業株式会社 | 2022-12-22 | — | — | WO | disclosed |
| US-11067888-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-20 | — | — | US | disclosed |
| US-20200257197-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-08-13 | — | — | US | disclosed |
| US-20190196329-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-06-27 | — | — | US | disclosed |
| US-20180149973-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-05-31 | — | — | US | disclosed |
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-9714217-B2 | Sulfonic acid derivative and photoacid generator | TOYO GOSEI CO., LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| US-9714217-B2 | Sulfonic acid derivative and photoacid generator | TOYO GOSEI CO., LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| US-8349990-B2 | Chain scission polyester polymers for photoresists | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) | 2013-01-08 | — | — | US | disclosed |
| US-20120289738-A1 | SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR | TOYO GOSEI CO., LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| US-20110127651-A1 | CHAIN SCISSION POLYESTER POLYMERS FOR PHOTORESISTS | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW (US) | 2011-06-02 | — | — | US | disclosed |
| US-7833690-B2 | Photoacid generators and lithographic resists comprising the same | THE UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (US) | 2010-11-16 | — | — | US | disclosed |
| WO-2009105667-A2 | CHAIN SCISSION POLYESTER POLYMERS FOR PHOTORESISTS | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) | 2009-08-27 | — | — | WO | disclosed |
| US-20070117043-A1 | Photoacid generators and lithographic resists comprising the same | NATIONAL SCIENCE FOUNDATION | 2007-05-24 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | ASIC1, ASIC3, CRY1 | ALDH1A1 565/4885L3MBTL1 4346/4885 |
| US-20180149973-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR | MCM4, RFC4, ATP1A4 | ALDH1A1 2391/4885L3MBTL1 4353/4885 |
| US-20120289738-A1 | SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR | CRY1, ASIC1, ASIC3 | ALDH1A1 461/4885L3MBTL1 3903/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.