SCHEMBL1949305

SCHEMBL1949305

CCC=C(C)C(=O)Oc1ccccc1O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GAA P10253 5/20 0.42
▸ MAPT P10636 4/20 0.42
▸ JAK2 O60674 2/20 0.42
▸ LMNA P02545 2/20 0.42
▸ CA1 P00915 2/20 0.40
▸ CA2 P00918 2/20 0.40
▸ TP53 P04637 1/20 0.40
▸ TSHR P16473 1/20 0.40
▸ KMT2A Q03164 3/20 0.39
▸ POLB P06746 1/20 0.39
▸ ESR1 P03372 4/20 0.36
▸ ESR2 Q92731 4/20 0.36
▸ MEN1 O00255 2/20 0.36
▸ SMN1; SMN2 Q16637 2/20 0.36
▸ HSD17B10 Q99714 2/20 0.36
▸ NPSR1 Q6W5P4 2/20 0.36
▸ USP2 O75604 1/20 0.36
▸ ALOX15 P16050 1/20 0.36
▸ PTGS2 P35354 2/20 0.36
▸ MAPK1 P28482 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28164367 0.84 LMNA (0.39) MAPTLMNATSHRKMT2APOLB
SCHEMBL7644976 0.84 TDP1 (0.42) GAAMAPTLMNAKMT2APOLB
SCHEMBL16672833 0.84 POLB (0.44) MAPTLMNACA1CA2KMT2A
SCHEMBL16672721 0.83 L3MBTL1 (0.50) GAAMAPTLMNAKMT2APOLB
SCHEMBL28111010 0.83 MAPT (0.40) MAPTLMNATP53TSHRKMT2A
SCHEMBL15194346 0.82 GAA (0.38) GAAMAPTJAK2LMNACA1
SCHEMBL4347897 0.80 MAPT (0.43) GAAMAPTJAK2LMNACA1
SCHEMBL27457567 0.80 ALDH1A1 (0.51) GAAMAPTTSHRKMT2AMEN1
SCHEMBL22365642 0.80 L3MBTL1 (0.43) LMNAKMT2AMEN1SMN1; SMN2MAPK1
SCHEMBL16673104 0.79 RXRA (0.41) GAAALDH1A1ATMTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110799626-B Composition, film, laminated structure, light-emitting device, display, and method for producing composition 住友化学株式会社 2023-02-28 — — CN disclosed
CN-110088209-B Layered substance-containing liquid and method for producing same 株式会社ADEKA 2023-01-31 — — CN disclosed
CN-111033837-A Metal foil, method for producing metal foil, negative electrode for secondary battery, and positive electrode for secondary battery 富士胶片株式会社 2020-04-17 — — CN disclosed
CN-110799626-A Composition, film, laminated structure, light-emitting device, display, and method for producing composition 住友化学株式会社 2020-02-14 — — CN disclosed
CN-110753616-A Composite body 富士胶片株式会社 2020-02-04 — — CN disclosed
CN-110637385-A Perforated metal foil, method for producing perforated metal foil, negative electrode for secondary battery, and positive electrode for secondary battery 富士胶片株式会社 2019-12-31 — — CN disclosed
CN-109072142-A It cleans with film forming agent and using the cleaning treatment method of the forming agent 狮王株式会社 2018-12-21 — — CN disclosed
CN-106062935-A Composition and organic thin-film transistor using same 住友化学株式会社 2016-10-26 — — CN disclosed
CN-104137236-B Electronic device insulating layer and method for manufacturing electronic device insulating layer 住友化学株式会社 2016-08-24 — — CN disclosed
CN-104137236-A Electronic device insulating layer and method for manufacturing electronic device insulating layer SUMITOMO CHEMICAL CO 2014-11-05 — — CN disclosed
CN-104040700-A INSULATION-LAYER MATERIAL FOR ELECTRONIC DEVICE, AND ELECTRONIC DEVICE SUMITOMO CHEMICAL CO 2014-09-10 — — CN disclosed
US-8507898-B2 Organic thin film transistor, method for manufacturing the same, display member using the organic thin film transistor, and display SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-08-13 — — US disclosed
CN-101978420-B Method for producing magnetic recording medium, magnetic recording medium and magnetic recording/reproducing apparatus SHOWA DENKO KK 2013-06-05 — — CN disclosed
CN-102612752-A Optical and thermal energy crosslinkable insulating layer material for organic thin film transistor SUMITOMO CHEMICAL CO 2012-07-25 — — CN disclosed
CN-102282186-A Resin composition for insulating layer — 2011-12-14 — — CN disclosed
US-20110147726-A1 ORGANIC THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING THE SAME, DISPLAY MEMBER USING THE ORGANIC THIN FILM TRANSISTOR, AND DISPLAY SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-06-23 — — US disclosed
US-20110136992-A1 COMPOSITION FOR INSULATING LAYER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-06-09 — — US disclosed
CN-102077355-A Organic thin film transistor, method for manufacturing the same, display member using the organic thin film transistor, and display SUMITOMO CHEMICAL CO 2011-05-25 — — CN disclosed
CN-101978420-A Method for producing magnetic recording medium, magnetic recording medium and magnetic recording/reproducing apparatus SHOWA DENKO KK 2011-02-16 — — CN disclosed
CN-101960559-A UV nanoimprint method, resin replica mold and method for producing the same, magnetic recording medium and method for producing the same, and magnetic recording/reproducing apparatus SHOWA DENKO KK 2011-01-26 — — CN disclosed
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