Potassium Ion

Potassium Ion

SCHEMBL1961610

CNCCS(=O)(=O)[O-].[K+]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10866607 0.94 BBOX1 (0.52)
SCHEMBL646481 0.94
SCHEMBL11729796 0.94 BBOX1 (0.52)
SCHEMBL31268422 0.94 BBOX1 (0.52)
SCHEMBL1962786 0.94 BBOX1 (0.52)
Lithium Ion SCHEMBL17272305 0.94
Potassium Ion SCHEMBL17272440 0.84 BBOX1 (0.48)
Potassium Ion SCHEMBL17272377 0.82 BBOX1 (0.46)
SCHEMBL17272288 0.79 BBOX1 (0.48)
Lithium Ion SCHEMBL17272060 0.79 BBOX1 (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1586625-B1 NOVEL SURFACTANTS AND USE THEREOF P & PF CO LTD (JP) 2009-06-03 EP claimed
US-7049464-B2 Process for producing of an aminoalkylsulfonic acid and a method of salt exchange for a salt thereof WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2006-05-23 US claimed
CN-1247699-C Polyorganosiloxane emulsion, process for producing the same, and material for cosmetic preparation DOW CORNING TORAY SILICONE (JP) 2006-03-29 CN claimed
US-20050261370-A1 Process for producing of an aminoalkylsulfonic acid and a method of salt exchange for a salt thereof WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2005-11-24 US claimed
EP-1548002-A1 PROCESS FOR PRODUCING AMINOALKYLSULFONIC ACID AND METHOD OF SALT EXCHANGE FOR SALT THEREOF Wako Pure Chemical Industries, Ltd. (JP) 2005-06-29 EP claimed
CN-1496387-A Polyorganosiloxane emulsion, process for producing the same, and material for cosmetic preparation 陶氏康宁东丽硅氧烷株式会社 2004-05-12 CN claimed
EP-4419235-A1 PROCESS FOR CAPTURING CO2 FROM A MOBILE SOURCE USING AN AMINO ACID SOLVENT Saudi Arabian Oil Company (SA) 2024-08-28 EP disclosed
CN-114031516-B Method for synthesizing N-acyl amino acid surfactant based on zirconium catalyst catalysis 长沙普济生物科技股份有限公司 2023-09-01 CN disclosed
WO-2023069741-A1 PROCESS FOR CAPTURING CO2 FROM A MOBILE SOURCE USING AN AMINO ACID SOLVENT SAUDI ARABIAN OIL COMPANY (SA) 2023-04-27 WO disclosed
CN-109072128-A Detergent composition and process for producing the same 旭化成精细化工股份有限公司 2018-12-21 CN disclosed
US-9718905-B2 Polythiophene, water-soluble electrically conductive polymer using it, and method for producing it TOSOH CORPORATION (JP) 2017-08-01 US disclosed
CN-105997554-A HAIR CLEANSING COMPOSITION 日油株式会社 2016-10-12 CN disclosed
CN-105585601-A Anti-aging skin external composition and preparation method thereof HAYASHIBARA CO 2016-05-18 CN disclosed
CN-1496387-A Polyorganosiloxane emulsion, process for producing the same, and material for cosmetic preparation 陶氏康宁东丽硅氧烷株式会社 2004-05-12 CN disclosed
EP-1381651-A1 POLYORGANOSILOXANE EMULSION COMPOSITION AND A COSMETIC MATERIAL MADE THEREFROM Dow Corning Toray Silicone Co.,Ltd. Patent Department (JP) 2004-01-21 EP disclosed
US-6602848-B2 Contains alkali metal N-methyltaurate, alkali metal taurate or alkali metal hypotaurate salt of specific organic acid or organic alkali N-methyltaurate, organic alkali taurate or organic alkali hypotaurate salt of specific organic acid SHISEIDO COMPANY, LTD. (JP) 2003-08-05 US disclosed
WO-2002088253-A1 POLYORGANOSILOXANE EMULSION COMPOSITION AND A COSMETIC MATERIAL MADE THEREFROM DOW CORNING TORAY SILICONE CO., LTD. (JP) 2002-11-07 WO disclosed
US-6355608-B1 DETERGENT COMPOSITION COMPRISING AQUEOUS SOLUTION OF ALKALI METAL N-METHYLTAURATE SALT OF FATTY ACID, IN CONCENTRATION OF AT LEAST 50 MOLE PERCENT BASED ON TOTAL MOLES OF ALKALI METAL SALT OF FATTY ACID PRESENT SHISEIDO CO., LTD. (JP) 2002-03-12 US disclosed
US-6344435-B1 Detergent composition SHISEIDO CO., LTD. (JP) 2002-02-05 US disclosed
CN-1250084-A Detergent composition SHISEIDO CO LTD (JP) 2000-04-12 CN disclosed