SCHEMBL19636161

SCHEMBL19636161

CS(Cc1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.44
CA2 P00918 2/20 0.44
PRSS1 P07477 2/20 0.44
PRSS2 P07478 2/20 0.44
PRSS3 P35030 2/20 0.44
FAAH O00519 1/20 0.44
ELANE P08246 1/20 0.44
PRTN3 P24158 1/20 0.44
CA5A P35218 1/20 0.44
CA9 Q16790 1/20 0.44
TP53 P04637 1/20 0.42
ALDH1A1 P00352 2/20 0.41
KDM4E B2RXH2 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
PSIP1 O75475 1/20 0.41
MMP1 P03956 1/20 0.40
MMP2 P08253 1/20 0.40
MMP9 P14780 1/20 0.40
MMP8 P22894 1/20 0.40
MMP13 P45452 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13990531 0.80 CA1 (0.44) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL1343355 0.76 CA1 (0.50) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL22908217 0.76 CA1 (0.50) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL20404601 0.74 PSIP1 (0.56) CA1CA2CA5ACA9TP53
SCHEMBL6231539 0.74 CA1 (0.48) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL22661006 0.73 ALDH1A1 (0.40) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL22429350 0.72 CA1 (0.46) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL92893 0.72 CA2 (0.58) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL17804288 0.72 PRSS1 (0.58) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL10791482 0.72 CA1 (0.52) CA1CA2PRSS1PRSS2PRSS3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230350296-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-02 US disclosed
WO-2017198840-A1 DENTAL COMPOSITION DENTSPLY DETREY GMBH (DE) 2017-11-23 WO disclosed
CN-100473681-C Surface treatment of plastic material with organic polymerisable and or crosslinkable composition having reactive functions RHONE POULENC CHIMIE (FR) 2009-04-01 CN disclosed
CN-100469820-C Treatment of the surface of plastic materials with polymerizable and/or crosslinkable organic compositions having reactive functions RHONE POULENC CHIMIE (FR) 2009-03-18 CN disclosed
CN-1418236-A Surface treatment of plastic material with organic polymerisable and or crosslinkable composition having reactive functions RHODIA CHIMIE SA (FR) 2003-05-14 CN disclosed
CN-1416447-A Plastic material surface treatment with polymerisable and/or crosslinkable organic compsn. having reactive functions RHODIA CHIMIE SA (FR) 2003-05-07 CN disclosed
CN-1090767-C Photoenhanced diffusion patterning for organic polymer films DU PONT (US) 2002-09-11 CN disclosed
CN-1083779-A On photo curable dielectric layer, form pattern DU PONT (US) 1994-03-16 CN disclosed
CN-1079827-A The Photoenhanced diffusion patterning of organic polymer films DU PONT (US) 1993-12-22 CN disclosed