Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 5/20 | 0.61 |
| ▸ | KLF10 | Q13118 | 1/20 | 0.50 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.48 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.48 |
| ▸ | CYP2D6 | P10635 | 6/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 4/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.45 |
| ▸ | HTT | P42858 | 2/20 | 0.45 |
| ▸ | SHBG | P04278 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | CASP6 | P55212 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21260626 | 0.94 | CYP2C19 (0.55) | CYP2C19KLF10GABRA1GABRB2CYP2D6 | |
| SCHEMBL10028315 | 0.89 | CYP2C19 (0.50) | CYP2C19KLF10GABRA1GABRB2CYP2D6 | |
| SCHEMBL11040770 | 0.89 | SHBG (0.57) | CYP2C19KLF10GABRA1GABRB2CYP2D6 | |
| SCHEMBL938679 | 0.87 | ALDH1A1 (0.49) | CYP2C19KLF10GABRA1GABRB2CYP2D6 | |
| SCHEMBL29577789 | 0.87 | ALDH1A1 (0.49) | CYP2C19KLF10GABRA1GABRB2CYP2D6 | |
| SCHEMBL224429 | 0.86 | ALOX15 (0.61) | CYP2C19KLF10GABRA1GABRB2CYP2D6 | |
| SCHEMBL26134510 | 0.86 | ALOX15 (0.61) | CYP2C19KLF10GABRA1GABRB2CYP2D6 | |
| SCHEMBL2618700 | 0.86 | KLF10 (0.50) | CYP2C19KLF10GABRA1GABRB2CYP2D6 | |
| SCHEMBL11777742 | 0.86 | CYP2C19 (0.67) | CYP2C19KLF10GABRA1GABRB2CYP2D6 | |
| SCHEMBL9447261 | 0.86 | CYP2C19 (0.47) | CYP2C19KLF10GABRA1GABRB2CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 468 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1806618-B1 | POSITIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED PRODUCT THEREOF | JSR CORP (JP) | 2010-06-09 | — | — | EP | claimed |
| EP-0370595-B1 | Binder compositions comprising low molecular weight poly(orthomethylolated)phenolic compound and novolac resin | BORDEN INC (US) | 1994-09-07 | — | — | EP | claimed |
| US-5118582-A | PATTERN FORMING MATERIAL AND PROCESS FOR FORMING PATTERN USING THE SAME | HITACHI, LTD. (JP) | 1992-06-02 | — | — | US | claimed |
| US-4994505-A | Ester-functional curing agent; bonding sand, refractory or foundry material | BORDEN, INC. (US) | 1991-02-19 | — | — | US | claimed |
| EP-0370595-A2 | Binder compositions comprising low molecular weight poly(orthomethylolated)phenolic compound and novolac resin | Borden, Inc. (US) | 1990-05-30 | — | — | EP | claimed |
| CN-110317174-B | Hydrogen barrier agent, composition for forming hydrogen barrier film, method for producing hydrogen barrier film, and electronic device | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| US-20240329525-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-10-03 | — | — | US | disclosed |
| CN-118444528-A | Photosensitive coloring resin composition, cured product, coloring spacer and image display device | 三菱化学株式会社 | 2024-08-06 | — | — | CN | disclosed |
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-12025916-B2 | Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-02 | — | — | US | disclosed |
| US-12025916-B2 | Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-02 | — | — | US | disclosed |
| US-4164487-A | SOLVENT-RESISTANT, FLEXIBLE COATINGS | THE DOW CHEMICAL COMPANY (US) | 1979-08-14 | — | — | US | disclosed |
| US-4098717-A | WATER IN OIL EMULSIONS | PETROLITE CORPORATION (US) | 1978-07-04 | — | — | US | disclosed |
| US-4043857-A | Method of joining plastic pipe | ALLIED CHEMICAL CORPORATION (US) | 1977-08-23 | — | — | US | disclosed |
| US-4035435-A | FORMALDEHYDE, RESORCINOL | COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN, RAISON SOCIALE MICHELIN & CIE (FR) | 1977-07-12 | — | — | US | disclosed |
| US-4032514-A | THIOALKYLATED OR AMINOALKYLATED, INFUSIBLE | PETROLITE CORPORATION (US) | 1977-06-28 | — | — | US | disclosed |
| US-4025454-A | PHENOLIC RESIN BLEND | COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN, RAISON SOCIALE MICHELIN & CIE (FR) | 1977-05-24 | — | — | US | disclosed |
| US-4013605-A | Phenolic resins from alkyl substituted dimethylolphenols | HOECHST AKTIENGESELLSCHAFT (DT) | 1977-03-22 | — | — | US | disclosed |
| US-3961814-A | Method of joining plastic pipe | ALLIED CHEMICAL CORPORATION (US) | 1976-06-08 | — | — | US | disclosed |