SCHEMBL19806858

SCHEMBL19806858

Cc1cc(C)c(C(c2ccc(O)cc2O)c2ccc(O)cc2O)cc1C

nearest known ligand 0.53

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
▸ TYR P14679 1/20 0.44
▸ TRPA1 O75762 1/20 0.38
▸ LMNA P02545 1/20 0.38
▸ CHRM1 P11229 1/20 0.38
▸ SLC6A2 P23975 1/20 0.38
▸ ADRA1A P35348 1/20 0.38
▸ HTR2B P41595 1/20 0.38
▸ ESR1 P03372 1/20 0.38
▸ ESR2 Q92731 1/20 0.38
▸ IL1B P01584 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL758292 0.91 KDM4E (0.43) TYRTRPA1LMNACHRM1SLC6A2
SCHEMBL20808569 0.84 ESR2 (0.46) TYRCHRM1ADRA1AHTR2BESR1
SCHEMBL28642768 0.83 TYR (0.52) TYRESR1
SCHEMBL19806859 0.83 TRPA1 (0.50) TYRTRPA1LMNACHRM1SLC6A2
SCHEMBL278739 0.82 TYR (0.44) TYRTRPA1LMNACHRM1SLC6A2
SCHEMBL2501926 0.79 ESR2 (0.49) TYRCHRM1ADRA1AHTR2BESR1
SCHEMBL29465793 0.79 ESR2 (0.49) TYRCHRM1ADRA1AHTR2BESR1
SCHEMBL23082245 0.78 TYR (0.46) TYRTRPA1
SCHEMBL19806865 0.77 TYR (0.34) TYR
SCHEMBL30375047 0.77 ALDH1A1 (0.45) TYRTRPA1LMNAESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210070683-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-11 — — US disclosed
US-20210070727-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-11 — — US disclosed
US-20210070685-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-11 — — US disclosed
WO-2018016640-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD 三菱瓦斯化学株式会社 2018-01-25 — — WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210070683-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD RER1, RTN4, FEM1B TYR 3769/4885TRPA1 1683/4885LMNA 3259/4885
US-20210070727-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD RDX, RTN4, CROCC TYR 3175/4885TRPA1 2486/4885LMNA 2368/4885
US-20210070685-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD RER1, RTN4, FEM1B TYR 3769/4885TRPA1 1683/4885LMNA 3259/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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