SCHEMBL19806863

SCHEMBL19806863

CC(C)Cc1ccc(C(c2ccc(O)cc2O)c2ccc(O)cc2O)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 3/20 0.47
▸ ESR2 Q92731 2/20 0.47
▸ TYR P14679 1/20 0.46
▸ GABRA1 P14867 1/20 0.45
▸ GABRB2 P47870 1/20 0.45
▸ GAA P10253 1/20 0.44
▸ MAPT P10636 1/20 0.44
▸ CRHBP P24387 1/20 0.44
▸ CRHR2 Q13324 1/20 0.44
▸ SMN1; SMN2 Q16637 1/20 0.44
▸ PTGS1 P23219 3/20 0.44
▸ PTGS2 P35354 3/20 0.44
▸ LMNA P02545 2/20 0.44
▸ CYP2C9 P11712 2/20 0.44
▸ AKR1C3 P42330 2/20 0.44
▸ CXCR1 P25024 2/20 0.44
▸ CXCR2 P25025 2/20 0.44
▸ ALB P02768 1/20 0.44
▸ ALOX5 P09917 1/20 0.44
▸ RARB P10826 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19806852 0.83 TYR (0.45) ESR1ESR2TYRGAAMAPT
SCHEMBL19806928 0.82 TYR (0.52) TYR
SCHEMBL19806857 0.81 TYR (0.53) ESR1ESR2TYRGAAPTGS1
SCHEMBL6838062 0.81 ESR1 (0.64) ESR1ESR2GAAMAPTCRHBP
SCHEMBL19806853 0.81 CNR1 (0.43) ESR1TYRGAAMAPTPTGS1
SCHEMBL9064707 0.80 TYR (0.50) ESR1ESR2TYRGAA
SCHEMBL22316996 0.79 ESR1 (0.46) ESR1ESR2GABRA1GABRB2GAA
SCHEMBL19806868 0.79 ALOX15 (0.47) ESR1ESR2TYRGAAMAPT
SCHEMBL19806870 0.78 TYR (0.50) ESR1TYRMAPTPTGS1PTGS2
SCHEMBL19806855 0.78 TYR (0.49) TYRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210070727-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-11 — — US disclosed
US-20210070683-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-11 — — US disclosed
US-20210070685-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-11 — — US disclosed
WO-2018016640-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD 三菱瓦斯化学株式会社 2018-01-25 — — WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210070683-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD RER1, RTN4, FEM1B ESR1 1539/4885ESR2 2068/4885TYR 3769/4885
US-20210070727-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD RDX, RTN4, CROCC ESR1 1453/4885ESR2 1492/4885TYR 3175/4885
US-20210070685-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD RER1, RTN4, FEM1B ESR1 1539/4885ESR2 2068/4885TYR 3769/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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