SCHEMBL198189

SCHEMBL198189

O=S(=O)(O)C1=CC2CCC1C2

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31064743 0.63 SLC6A3 (0.40) CYP19A1
SCHEMBL16000715 0.57 LMNA (0.50)
SCHEMBL29219505 0.57 LMNA (0.50)
SCHEMBL13915049 0.52
Adamantane SCHEMBL27851735 0.47 CA5A (0.50)
Sulfuric Acid SCHEMBL11235576 0.46
Sulfuric Acid SCHEMBL27946758 0.46 CA5A (0.86)
Sulfuric Acid SCHEMBL32784 0.46
Sulfuric Acid SCHEMBL4533776 0.46 CA5A (0.86)
SCHEMBL31257847 0.45 TSHR (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-7031869-A None JP disclosed
CN-101981665-B Surface-modified colloidal silica and polishing composition for chemical mechanical polishing containing the same ADEKA CORP 2012-11-21 CN disclosed
US-8088537-B2 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-03 US disclosed
US-7915318-B2 Aqueous ROMP-based monolith materials and methods for making GENERAL ELECTRIC COMPANY (US) 2011-03-29 US disclosed
CN-101981665-A Surface-modified colloidal silica and polishing composition for chemical mechanical polishing containing the same ADEKA CORP 2011-02-23 CN disclosed
US-20100063200-A1 AQUEOUS ROMP-BASED MONOLITH MATERIALS AND METHODS FOR MAKING GENERAL ELECTRIC COMPANY (US) 2010-03-11 US disclosed
US-20090197200-A1 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-06 US disclosed
US-20080306230-A1 Composition and Associated Method GENERAL ELECTRIC COMPANY (US) 2008-12-11 US disclosed
US-6869744-B2 Chemically amplified positive resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-03-22 US disclosed
US-20040161710-A1 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2004-08-19 US disclosed
US-20040162337-A1 Lactone-type acidic compounds CITY UNIVERSITY OF HONG KONG (HK) 2004-08-19 US disclosed
US-20020042017-A1 Chemically amplified positive resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-04-11 US disclosed
JP-H0731869-A MICROCAPSULATION OF SOLID PARTICLE JAPAN SYNTHETIC RUBBER CO LTD 1995-02-03 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040162337-A1 Lactone-type acidic compounds ACSL1, ELOVL1, FASN CYP19A1 40/4885
US-20080306230-A1 Composition and Associated Method COX6C, GRIA4, CYCS CYP19A1 1488/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.