Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CD81 | P60033 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1994420 | 0.83 | THRB (0.33) | THRBCYP2C9CD81KMT2ASMN1; SMN2 | |
| SCHEMBL503560 | 0.80 | THRB (0.35) | THRBCYP2C9CD81KMT2AALDH1A1 | |
| SCHEMBL701599 | 0.80 | THRB (0.35) | THRBCYP2C9CD81KMT2AALDH1A1 | |
| Methacrylic Acid SCHEMBL27133680 | 0.70 | KMT2A (0.32) | KMT2ASMN1; SMN2ALDH1A1 | |
| SCHEMBL700266 | 0.70 | PKM (0.34) | CD81 | |
| SCHEMBL2196307 | 0.68 | GRM2 (0.36) | KMT2ASMN1; SMN2ALDH1A1 | |
| Acetic Acid SCHEMBL700515 | 0.68 | THRB (0.42) | THRBCYP2C9KMT2AALDH1A1 | |
| SCHEMBL503461 | 0.68 | ALDH1A1 (0.31) | CD81ALDH1A1 | |
| Methacrylic Acid SCHEMBL27136409 | 0.68 | KMT2A (0.33) | KMT2ASMN1; SMN2ALDH1A1 | |
| SCHEMBL10322379 | 0.67 | GLA (0.30) | THRBCYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8431324-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20110151378-A1 | RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2011-06-23 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |