Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | CD81 | P60033 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.32 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL701599 | 0.86 | THRB (0.35) | THRBCYP2C9CD81LMNAEPHX1 | |
| SCHEMBL700266 | 0.84 | PKM (0.34) | CD81 | |
| SCHEMBL503461 | 0.83 | ALDH1A1 (0.31) | CD81ALDH1A1HTT | |
| SCHEMBL1990174 | 0.80 | THRB (0.32) | THRBCYP2C9CD81ALDH1A1KMT2A | |
| SCHEMBL11928274 | 0.79 | CD81 (0.31) | CD81 | |
| SCHEMBL1994420 | 0.78 | THRB (0.33) | THRBCYP2C9CD81EPHX2ALDH1A1 | |
| Acetic Acid SCHEMBL700515 | 0.72 | THRB (0.42) | THRBCYP2C9LMNAEPHX1EPHX2 | |
| SCHEMBL10322379 | 0.71 | GLA (0.30) | THRBCYP2C9GLA | |
| SCHEMBL5669232 | 0.70 | GLA (0.33) | THRBCYP2C9LMNAGLAMEN1 | |
| SCHEMBL11634182 | 0.70 | GRIN2D (0.32) | THRBCYP2C9LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9527938-B2 | Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate | MITSUBISHI RAYON CO., LTD. (JP) | 2016-12-27 | — | — | US | claimed |
| US-20150099230-A1 | COPOLYMER FOR LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME, RESIST COMPOSITION, AND METHOD OF MANUFACTURING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2015-04-09 | — | — | US | claimed |
| EP-2287671-B1 | Process for forming a coated substrate | COMMW SCIENT IND RES ORG (AU) | 2012-06-06 | — | — | EP | claimed |
| EP-2287671-A1 | Process for forming a coated substrate | Commonwealth Scientific and Industrial Research Organisation (AU) | 2011-02-23 | — | — | EP | claimed |
| US-20200201176-A1 | Resist Composition and Resist Pattern Forming Method | TOKYO ELECTRON LIMITED (JP) | 2020-06-25 | — | — | US | disclosed |
| US-10336851-B2 | Copolymer for semiconductor lithography, resist composition, and method for manufacturing substrate | MITSUBISHI CHEMICAL CORPORATION | 2019-07-02 | — | — | US | disclosed |
| US-20190146340-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-05-16 | — | — | US | disclosed |
| EP-1708027-B1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2019-03-13 | — | — | EP | disclosed |
| US-9850334-B2 | Manufacturing method of polymer | TOYO GOSEI CO., LTD. (JP) | 2017-12-26 | — | — | US | disclosed |
| US-9733564-B2 | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-08-15 | — | — | US | disclosed |
| US-9594303-B2 | Resist pattern-forming method and photoresist composition | JSR CORPORATION (JP) | 2017-03-14 | — | — | US | disclosed |
| US-9587065-B2 | Composition for pattern formation, and pattern-forming method | JSR CORPORATION (JP) | 2017-03-07 | — | — | US | disclosed |
| US-20070269754-A1 | Acrylic Polymer and Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| US-7214467-B2 | Photosensitive resin composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-20070054214-A1 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2007-03-08 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060234154-A1 | Mixture containing acid generator and free radical catalyst; acrylated ester monomer | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-1480079-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-24 | — | — | EP | disclosed |
| US-20040009430-A1 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. | 2004-01-15 | — | — | US | disclosed |
| EP-1376232-A1 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |