Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | CD81 | P60033 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11928274 | 0.90 | CD81 (0.31) | CD81 | |
| SCHEMBL503560 | 0.83 | THRB (0.35) | ALDH1A1HTTCD81 | |
| SCHEMBL700266 | 0.75 | PKM (0.34) | CD81 | |
| SCHEMBL701599 | 0.72 | THRB (0.35) | ALDH1A1HTTCD81 | |
| SCHEMBL158981 | 0.68 | APLNR (0.30) | — | |
| SCHEMBL4799351 | 0.68 | APLNR (0.30) | — | |
| SCHEMBL1990174 | 0.68 | THRB (0.32) | ALDH1A1CD81 | |
| SCHEMBL1994420 | 0.66 | THRB (0.33) | ALDH1A1CD81 | |
| SCHEMBL7159145 | 0.65 | ALDH1A1 (0.32) | ALDH1A1HTTNPSR1 | |
| SCHEMBL468321 | 0.65 | ALDH1A1 (0.30) | ALDH1A1HTTNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895229-B2 | Composition for formation of upper layer film, and method for formation of photoresist pattern | JSR CORPORATION (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8435718-B2 | Upper layer-forming composition and photoresist patterning method | JSR CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| US-20120028198-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-7781142-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20100021852-A1 | COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMATION OF PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-01-28 | — | — | US | disclosed |
| US-20080038661-A1 | Copolymer and Top Coating Composition | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |