⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18476387 | 0.84 | ALDH1A1 (0.32) | — | |
| SCHEMBL18476386 | 0.83 | — | — | |
| SCHEMBL18476389 | 0.81 | — | — | |
| SCHEMBL21786273 | 0.80 | — | — | |
| SCHEMBL23974082 | 0.73 | ALDH1A1 (0.30) | — | |
| SCHEMBL23140675 | 0.72 | — | — | |
| SCHEMBL24452996 | 0.72 | — | — | |
| SCHEMBL18470622 | 0.71 | TSHR (0.32) | — | |
| SCHEMBL21251557 | 0.71 | — | — | |
| SCHEMBL23974108 | 0.70 | ALDH1A1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230341775-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-26 | — | — | US | disclosed |
| US-20220404701-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION, PHOTOMASK BLANK, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING POLYMER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-12-22 | — | — | US | disclosed |
| US-9944738-B2 | Polymer compound, positive resist composition, laminate, and resist patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-04-17 | — | — | US | disclosed |