SCHEMBL2008433

SCHEMBL2008433

CCC(C=O)(C(c1ccccc1)c1ccc(N2CCOCC2)cc1)N(C)C

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
RORC P51449 4/20 0.42
ALDH1A1 P00352 6/20 0.40
MAPT P10636 5/20 0.40
LMNA P02545 3/20 0.40
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
POLB P06746 3/20 0.40
PKM P14618 1/20 0.39
TSHR P16473 1/20 0.39
SMN1; SMN2 Q16637 3/20 0.38
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
KDM4E B2RXH2 1/20 0.38
ACP1 P24666 1/20 0.38
KCNQ2 O43526 1/20 0.37
ESR1 P03372 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27619268 0.73 RORC (0.44) RORCALDH1A1MAPTLMNAMEN1
SCHEMBL28447021 0.73 MAPT (0.48) ALDH1A1MAPTLMNAMEN1KMT2A
SCHEMBL2008435 0.71 RORC (0.46) RORCALDH1A1MAPTLMNAMEN1
SCHEMBL1515690 0.71 LMNA (0.55) RORCALDH1A1MAPTLMNAMEN1
SCHEMBL12592363 0.71 ACP1 (0.48) ALDH1A1MAPTLMNAMEN1KMT2A
SCHEMBL12592365 0.71 ACP1 (0.48) ALDH1A1MAPTLMNAMEN1KMT2A
SCHEMBL12592307 0.71 ACP1 (0.48) ALDH1A1MAPTLMNAMEN1KMT2A
SCHEMBL6850127 0.71 RORC (0.46) RORCALDH1A1MAPTLMNAMEN1
SCHEMBL27469490 0.71 KCNA5 (0.47) ALDH1A1MAPTLMNAMEN1KMT2A
SCHEMBL28961269 0.70 RORC (0.45) RORCALDH1A1MAPTLMNAPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7964684-B2 Polysiesquioxanes preferably comprising vinyl or ethynyl silanetriol; improved inhibition of film shrinkage and degassing during curing; uniform thickness, low refractive index FUJIFILM CORPORATION (JP) 2011-06-21 US claimed
US-7964684-B2 Polysiesquioxanes preferably comprising vinyl or ethynyl silanetriol; improved inhibition of film shrinkage and degassing during curing; uniform thickness, low refractive index FUJIFILM CORPORATION (JP) 2011-06-21 US disclosed
US-20080213602-A1 ANTIREFLECTION FILM FORMING COMPOSITION, ANITREFLECTION FILM AND OPTICAL DEVICE FUJIFILM CORPORATION (JP) 2008-09-04 US disclosed