SCHEMBL2008435

SCHEMBL2008435

CN(C)C(C=O)CCC(c1ccccc1)c1ccc(N2CCOCC2)cc1

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
RORC P51449 4/20 0.46
LMNA P02545 1/20 0.42
PKM P14618 1/20 0.41
TSHR P16473 1/20 0.41
ALDH1A1 P00352 4/20 0.41
ACHE P22303 1/20 0.40
MAPT P10636 5/20 0.39
SMN1; SMN2 Q16637 3/20 0.39
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
KDM4E B2RXH2 1/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
ACP1 P24666 1/20 0.39
POLB P06746 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.38
MAOB P27338 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8160960 0.80 MAPT (0.43) RORCLMNAALDH1A1MAPTSMN1; SMN2
SCHEMBL21062042 0.80 MAPT (0.43) RORCLMNAALDH1A1MAPTSMN1; SMN2
SCHEMBL4369405 0.79 RORC (0.45) RORCLMNAPKMTSHRALDH1A1
SCHEMBL1515690 0.76 LMNA (0.55) RORCLMNAPKMTSHRALDH1A1
SCHEMBL28488603 0.74 RORC (0.47) RORCLMNAPKMTSHRALDH1A1
SCHEMBL22463809 0.72 RORC (0.45) RORCLMNAPKMTSHRALDH1A1
SCHEMBL21681914 0.72 ALDH1A1 (0.43) RORCLMNAALDH1A1MAPTSMN1; SMN2
SCHEMBL5214166 0.72 ALDH1A1 (0.43) RORCLMNAALDH1A1MAPTSMN1; SMN2
SCHEMBL2008433 0.71 RORC (0.42) RORCLMNAPKMTSHRALDH1A1
SCHEMBL3814075 0.71 LMNA (0.56) RORCLMNAPKMTSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7964684-B2 Polysiesquioxanes preferably comprising vinyl or ethynyl silanetriol; improved inhibition of film shrinkage and degassing during curing; uniform thickness, low refractive index FUJIFILM CORPORATION (JP) 2011-06-21 US claimed
US-7964684-B2 Polysiesquioxanes preferably comprising vinyl or ethynyl silanetriol; improved inhibition of film shrinkage and degassing during curing; uniform thickness, low refractive index FUJIFILM CORPORATION (JP) 2011-06-21 US disclosed
US-20080213602-A1 ANTIREFLECTION FILM FORMING COMPOSITION, ANITREFLECTION FILM AND OPTICAL DEVICE FUJIFILM CORPORATION (JP) 2008-09-04 US disclosed