SCHEMBL20101858

SCHEMBL20101858

CC(=O)Oc1ccc2c(c1)C(C(C)C)C(C(C)C)C2

nearest known ligand 0.51

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 3/20 0.51
OPRD1 P41143 2/20 0.46
OPRK1 P41145 1/20 0.43
CA2 P00918 1/20 0.39
CA5A P35218 1/20 0.39
KDM4E B2RXH2 3/20 0.37
LMNA P02545 2/20 0.37
CYP3A4 P08684 1/20 0.36
ACHE P22303 5/20 0.36
GLA P06280 2/20 0.36
GAA P10253 2/20 0.36
ALDH1A1 P00352 2/20 0.35
MAPT P10636 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
NR1H2 P55055 1/20 0.35
NR1H3 Q13133 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14827326 0.74 OPRM1 (0.55) OPRM1OPRD1OPRK1CA2CA5A
SCHEMBL20109885 0.69 OPRM1 (0.48) OPRM1OPRD1OPRK1CA2CA5A
SCHEMBL13533174 0.68 OPRM1 (0.48) OPRM1OPRD1OPRK1
SCHEMBL14374374 0.68 ACHE (0.50) OPRM1OPRD1OPRK1CA2CA5A
SCHEMBL8982175 0.68 OPRM1 (0.46) OPRM1OPRD1OPRK1CA2CA5A
SCHEMBL11342772 0.67 CA2 (0.48) OPRM1CA2CA5AKDM4ELMNA
SCHEMBL10585452 0.67 ACHE (0.56) OPRM1OPRD1CA2CA5AKDM4E
SCHEMBL19490417 0.67 HTR2A (0.44) OPRM1OPRK1
SCHEMBL11162905 0.66 LMNA (0.49) OPRM1OPRD1OPRK1KDM4ELMNA
Hydrochloric Acid SCHEMBL4784885 0.66 ACHE (0.55) OPRM1OPRD1CA2CA5AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230333478-A1 PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND KIT FUJIFILM CORPORATION (JP) 2023-10-19 US disclosed
US-11733611-B2 Pattern forming method, method for producing electronic device, and kit FUJIFILM CORPORATION (JP) 2023-08-22 US disclosed
US-10599038-B2 Rinsing liquid, pattern forming method, and electronic device manufacturing method FUJIFILM CORPORATION (JP) 2020-03-24 US disclosed
US-20190227435-A1 PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND KIT FUJIFILM CORPORATION (JP) 2019-07-25 US disclosed
US-20180120708-A1 RINSING LIQUID, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed