Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | OPRM1 | P35372 | 3/20 | 0.48 |
| ▸ | OPRD1 | P41143 | 2/20 | 0.46 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.46 |
| ▸ | ACHE | P22303 | 11/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA5A | P35218 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3413664 | 0.76 | MTNR1A (0.44) | — | |
| SCHEMBL14827326 | 0.74 | OPRM1 (0.55) | OPRM1OPRD1OPRK1ACHECA2 | |
| SCHEMBL4261860 | 0.70 | MTNR1A (0.62) | — | |
| SCHEMBL20101858 | 0.69 | OPRM1 (0.51) | OPRM1OPRD1OPRK1ACHECA2 | |
| SCHEMBL3409346 | 0.69 | OPRM1 (0.46) | OPRM1OPRD1OPRK1KDM4ELMNA | |
| SCHEMBL14374374 | 0.68 | ACHE (0.50) | OPRM1OPRD1OPRK1ACHECA2 | |
| SCHEMBL3407256 | 0.68 | OPRM1 (0.42) | OPRM1OPRD1OPRK1KDM4ELMNA | |
| SCHEMBL10585452 | 0.67 | ACHE (0.56) | OPRM1OPRD1ACHECA2CA5A | |
| SCHEMBL18976626 | 0.67 | CHRNB2 (0.40) | — | |
| SCHEMBL11162905 | 0.66 | LMNA (0.49) | OPRM1OPRD1OPRK1ACHEKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180120701-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |