SCHEMBL20102169

SCHEMBL20102169

C=CC(=O)OC(c1ccccc1C)C(C)C

nearest known ligand 0.38

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.38
KDM4E B2RXH2 1/20 0.34
POLB P06746 1/20 0.34
ACP3 P15309 1/20 0.34
THRB P10828 3/20 0.33
ALDH1A1 P00352 1/20 0.33
HCAR2 Q8TDS4 1/20 0.33
TSHR P16473 1/20 0.33
THRA P10827 1/20 0.31
ACHE P22303 1/20 0.31
AKT1 P31749 1/20 0.31
MAPK1 P28482 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28268635 0.89 ESR1 (0.37) ESR1KDM4EPOLBACP3THRB
SCHEMBL3684997 0.84 HCAR2 (0.41) ESR1KDM4EPOLBACP3THRB
SCHEMBL4595706 0.79 HCAR2 (0.46) THRBALDH1A1HCAR2AKT1L3MBTL1
SCHEMBL28200013 0.75 HCAR2 (0.40) ESR1POLBHCAR2TSHRMAPK1
SCHEMBL181491 0.73 HPGD (0.43) KDM4ETHRBALDH1A1TSHRTHRA
SCHEMBL20102165 0.72 HCAR2 (0.39) KDM4ETHRBALDH1A1HCAR2TSHR
SCHEMBL1906054 0.71 GABRA1 (0.46) POLBTHRBHCAR2TSHRTHRA
SCHEMBL10437473 0.71 CYP1A2 (0.39) THRBALDH1A1TSHRTHRAL3MBTL1
SCHEMBL24708816 0.71 THRB (0.43) ESR1THRBALDH1A1HCAR2AKT1
SCHEMBL23974088 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10739678-B2 Photocurable composition, pattern forming method, and method for manufacturing device FUJIFILM CORPORATION (JP) 2020-08-11 US disclosed
US-20180120698-A1 PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed
US-20180120698-A1 PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed