SCHEMBL20102177

SCHEMBL20102177

C=CC(=O)OC(C)c1c(Cl)cccc1Cl

nearest known ligand 0.38

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
FGFR4 P22455 4/20 0.38
HCAR2 Q8TDS4 1/20 0.38
GSR P00390 1/20 0.36
HPGD P15428 4/20 0.35
ALDH1A1 P00352 3/20 0.35
TSHR P16473 2/20 0.34
POLB P06746 1/20 0.34
NPC1 O15118 1/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
ALOX15 P16050 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10530082 0.85 ALDH1A1 (0.44) HPGDALDH1A1TSHRPOLBNPC1
SCHEMBL20102165 0.81 HCAR2 (0.39) HCAR2HPGDALDH1A1TSHR
SCHEMBL20102173 0.76 CTSS (0.37) HCAR2ALDH1A1SMN1; SMN2
SCHEMBL11029507 0.75 ALDH1A1 (0.40) HPGDALDH1A1TSHRPOLBNPC1
SCHEMBL6536970 0.74 HCAR2 (0.53) HCAR2HPGDALDH1A1TSHRNPC1
SCHEMBL10790280 0.74 HPGD (0.40) HPGDALDH1A1NPC1SMN1; SMN2MEN1
SCHEMBL28863896 0.74 HCAR2 (0.67) HCAR2HPGDALDH1A1KMT2A
SCHEMBL41557 0.74 HCAR2 (0.67) HCAR2HPGDALDH1A1KMT2A
SCHEMBL10795111 0.73 KMT2A (0.48) GSRHPGDALDH1A1POLBSMN1; SMN2
SCHEMBL11636414 0.73 HCAR2 (0.39) HCAR2HPGDALDH1A1NPC1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10739678-B2 Photocurable composition, pattern forming method, and method for manufacturing device FUJIFILM CORPORATION (JP) 2020-08-11 US disclosed
US-20180120698-A1 PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed
US-20180120698-A1 PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed