SCHEMBL20102173

SCHEMBL20102173

C=CC(=O)OC(C)c1c(C(F)(F)F)cccc1C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CTSS P25774 6/20 0.37
HCAR2 Q8TDS4 1/20 0.36
MAOB P27338 3/20 0.35
NFKB1 P19838 1/20 0.34
TAS2R14 Q9NYV8 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
KCNK3 O14649 1/20 0.34
KCNK9 Q9NPC2 1/20 0.34
CTSK P43235 2/20 0.33
ALDH1A1 P00352 1/20 0.33
P2RX7 Q99572 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
EGFR P00533 1/20 0.32
AKR1C3 P42330 1/20 0.32
AKR1C2 P52895 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20102165 0.78 HCAR2 (0.39) HCAR2ALDH1A1
SCHEMBL20102177 0.76 FGFR4 (0.38) HCAR2SMN1; SMN2ALDH1A1
SCHEMBL28322477 0.74 TEAD1 (0.45) HCAR2AKR1C3AKR1C2
SCHEMBL20102166 0.73 HCAR2 (0.39) HCAR2ALDH1A1
SCHEMBL11029507 0.72 ALDH1A1 (0.40) NFKB1SMN1; SMN2ALDH1A1NPSR1
SCHEMBL6536970 0.71 HCAR2 (0.53) HCAR2SMN1; SMN2ALDH1A1
SCHEMBL8767852 0.71 HCAR2 (0.37) HCAR2ALDH1A1
SCHEMBL2743763 0.71 HCAR2 (0.37) HCAR2ALDH1A1
SCHEMBL28863896 0.70 HCAR2 (0.67) HCAR2ALDH1A1
SCHEMBL41557 0.70 HCAR2 (0.67) HCAR2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10739678-B2 Photocurable composition, pattern forming method, and method for manufacturing device FUJIFILM CORPORATION (JP) 2020-08-11 US disclosed
US-20180120698-A1 PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed
US-20180120698-A1 PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed