SCHEMBL20184778

SCHEMBL20184778

CCCCCCN=C=Nc1ccc(F)cc1

nearest known ligand 0.40

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.40
PSMD14 O00487 1/20 0.37
HSP90AA1 P07900 1/20 0.37
MMP2 P08253 1/20 0.37
MC4R P32245 1/20 0.37
RAD52 P43351 1/20 0.37
HTR7 P34969 1/20 0.34
GAA P10253 1/20 0.34
ENPP2 Q13822 1/20 0.34
GCGR P47871 5/20 0.32
NOS3 P29474 2/20 0.32
NOS1 P29475 2/20 0.32
TRPA1 O75762 1/20 0.31
KCNH3 Q9ULD8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18245041 0.85 NAAA (0.41) NAAANOS3NOS1
SCHEMBL961359 0.85 NAAA (0.41) NAAANOS3NOS1
SCHEMBL20184812 0.83 NAAA (0.40) NAAAGAANOS1
SCHEMBL18245210 0.83 CYP3A4 (0.42) NAAAENPP2
SCHEMBL20184811 0.83 NAAA (0.40) NAAAGAANOS3NOS1
SCHEMBL18244944 0.83 NAAA (0.40) NAAA
SCHEMBL20184784 0.83 NAAA (0.40) NAAA
SCHEMBL18245029 0.83 NAAA (0.42) NAAA
SCHEMBL964813 0.83 NAAA (0.42) NAAA
SCHEMBL18245615 0.83 NAAA (0.38) NAAAGCGRNOS3NOS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3327002-B1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2020-08-19 EP disclosed
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-01 US disclosed
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-01-03 US disclosed
EP-3327002-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR Wako Pure Chemical Industries, Ltd. (JP) 2018-05-30 EP disclosed
CN-107848963-A Alkali-producing agent and/or radical-generating agent having acid resistance, and curable resin composition containing same 和光纯药工业株式会社 2018-03-27 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator REV1, RER1, CBR1 NAAA 984/4885PSMD14 1980/4885HSP90AA1 1470/4885
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR REV1, RER1, CBR1 NAAA 984/4885PSMD14 1980/4885HSP90AA1 1470/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.