SCHEMBL20184784

SCHEMBL20184784

CCCCCCN=C=Nc1ccc(I)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.40
CHUK O15111 1/20 0.30
DAPK3 O43293 1/20 0.30
JAK2 O60674 1/20 0.30
ROCK2 O75116 1/20 0.30
PRKCG P05129 1/20 0.30
CDK1 P06493 1/20 0.30
PIM1 P11309 1/20 0.30
RPS6KB1 P23443 1/20 0.30
CDK2 P24941 1/20 0.30
AKT1 P31749 1/20 0.30
AKT2 P31751 1/20 0.30
MAPKAPK2 P49137 1/20 0.30
BLK P51451 1/20 0.30
RPS6KA3 P51812 1/20 0.30
JAK3 P52333 1/20 0.30
LIMK1 P53667 1/20 0.30
PRKCZ Q05513 1/20 0.30
PRKCD Q05655 1/20 0.30
PAK1 Q13153 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18245041 0.85 NAAA (0.41) NAAACHUKDAPK3JAK2ROCK2
SCHEMBL961359 0.85 NAAA (0.41) NAAACHUKDAPK3JAK2ROCK2
SCHEMBL20184778 0.83 NAAA (0.40) NAAA
SCHEMBL18244944 0.83 NAAA (0.40) NAAA
SCHEMBL20184811 0.83 NAAA (0.40) NAAA
SCHEMBL18245210 0.83 CYP3A4 (0.42) NAAA
SCHEMBL20184812 0.83 NAAA (0.40) NAAACHUKDAPK3JAK2ROCK2
SCHEMBL18245615 0.83 NAAA (0.38) NAAA
SCHEMBL18245029 0.83 NAAA (0.42) NAAA
SCHEMBL964813 0.83 NAAA (0.42) NAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3327002-B1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2020-08-19 EP disclosed
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-01 US disclosed
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-01-03 US disclosed
EP-3327002-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR Wako Pure Chemical Industries, Ltd. (JP) 2018-05-30 EP disclosed
CN-107848963-A Alkali-producing agent and/or radical-generating agent having acid resistance, and curable resin composition containing same 和光纯药工业株式会社 2018-03-27 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator REV1, RER1, CBR1 NAAA 984/4885CHUK 3644/4885DAPK3 2858/4885
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR REV1, RER1, CBR1 NAAA 984/4885CHUK 3644/4885DAPK3 2858/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.