SCHEMBL20184811

SCHEMBL20184811

CCCCCCN=C=Nc1ccc(Cl)cc1

nearest known ligand 0.40

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.37
KCNH2 Q12809 12/20 0.36
KCNA3 P22001 3/20 0.36
KDM4E B2RXH2 2/20 0.36
GAA P10253 1/20 0.36
ALDH1A1 P00352 1/20 0.33
POLB P06746 1/20 0.33
NOS3 P29474 1/20 0.33
NOS1 P29475 1/20 0.33
NOS2 P35228 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18245041 0.85 NAAA (0.41) NAAASMN1; SMN2KCNH2KDM4EALDH1A1
SCHEMBL961359 0.85 NAAA (0.41) NAAASMN1; SMN2KCNH2KDM4EALDH1A1
SCHEMBL18245210 0.83 CYP3A4 (0.42) NAAAKDM4EALDH1A1
SCHEMBL20184812 0.83 NAAA (0.40) NAAASMN1; SMN2GAAALDH1A1NOS1
SCHEMBL20184778 0.83 NAAA (0.40) NAAAGAANOS3NOS1
SCHEMBL18244944 0.83 NAAA (0.40) NAAAKCNH2KDM4EALDH1A1
SCHEMBL20184784 0.83 NAAA (0.40) NAAA
SCHEMBL18245615 0.83 NAAA (0.38) NAAASMN1; SMN2KCNH2NOS3NOS1
SCHEMBL18245029 0.83 NAAA (0.42) NAAASMN1; SMN2KCNH2
SCHEMBL964813 0.83 NAAA (0.42) NAAASMN1; SMN2KCNH2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3327002-B1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2020-08-19 EP disclosed
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-01 US disclosed
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-01-03 US disclosed
EP-3327002-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR Wako Pure Chemical Industries, Ltd. (JP) 2018-05-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator REV1, RER1, CBR1 NAAA 984/4885SMN1; SMN2 1447/4885KCNH2 1490/4885
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR REV1, RER1, CBR1 NAAA 984/4885SMN1; SMN2 1447/4885KCNH2 1490/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.