Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | GLA | P06280 | 1/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 3/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | CRHBP | P24387 | 1/20 | 0.36 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.36 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.36 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.36 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.35 |
| ▸ | ITGB1 | P05556 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2827407 | 0.83 | GLA (0.44) | THRBCYP2C9GLAHSD11B1L3MBTL1 | |
| SCHEMBL161391 | 0.77 | GLA (0.45) | THRBCYP2C9GLAHSD11B1L3MBTL1 | |
| SCHEMBL7523671 | 0.76 | HSD11B1 (0.40) | THRBCYP2C9GLAHSD11B1L3MBTL1 | |
| SCHEMBL29281849 | 0.76 | GABBR2 (0.38) | THRBCYP2C9GLAHSD11B1L3MBTL1 | |
| SCHEMBL19873125 | 0.76 | ALDH1A1 (0.40) | THRBCYP2C9GLAHSD11B1L3MBTL1 | |
| SCHEMBL27899350 | 0.74 | HSD11B1 (0.46) | THRBCYP2C9GLAHSD11B1L3MBTL1 | |
| SCHEMBL29163591 | 0.72 | THRB (0.37) | THRBCYP2C9GLAHSD11B1L3MBTL1 | |
| SCHEMBL15401621 | 0.71 | GLA (0.36) | THRBCYP2C9GLAHSD11B1HTT | |
| SCHEMBL10323133 | 0.71 | GLA (0.41) | THRBCYP2C9GLAHSD11B1L3MBTL1 | |
| SCHEMBL19557168 | 0.71 | HSD11B1 (0.48) | THRBCYP2C9GLAHSD11B1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10670965-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-06-02 | — | — | US | claimed |
| US-9983477-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-05-29 | — | — | US | claimed |
| EP-2527380-B1 | Photosensitive compositions | ROHM & HAAS ELECT MAT (US) | 2013-12-18 | — | — | EP | claimed |
| US-8507176-B2 | Photosensitive compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-08-13 | — | — | US | claimed |
| EP-2341089-B1 | Photosensitive compositions | ROHM & HAAS ELECT MAT (US) | 2013-02-13 | — | — | EP | claimed |
| US-20110269074-A1 | NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-11-03 | — | — | US | claimed |
| EP-2372456-A2 | Novel polymers and photoresist compositions | Rohm and Haas Electronic Materials LLC (US) | 2011-10-05 | — | — | EP | claimed |
| US-20110236823-A1 | NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-09-29 | — | — | US | claimed |
| EP-2341089-A1 | Photosensitive compositions | Rohm and Haas Electronic Materials LLC (US) | 2011-07-06 | — | — | EP | claimed |
| US-20110159429-A1 | PHOTOSENSITIVE COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-06-30 | — | — | US | claimed |
| US-7838199-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-11-23 | — | — | US | claimed |
| US-20080206671-A1 | Novel polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-08-28 | — | — | US | claimed |
| US-7014980-B2 | Includes a polymer containing at least one of the following monomers: 1,1,1-trifluoro-2-trifluoromethyl-2-hydroxy-(4 or 5)-pentyl (meth)acrylate or 2-{[5-(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornyl]}(meth)acrylate | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-03-21 | — | — | US | claimed |
| US-20050019696-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-01-27 | — | — | US | claimed |
| US-6806026-B2 | POLYMER OF A FLUORINATED HYDROXYALKYL ACRYLATE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-10-19 | — | — | US | claimed |
| US-20030224283-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-04 | — | — | US | claimed |
| CN-111433243-B | Curable resin composition, laminate, optical filter, and compound | JSR株式会社 | 2023-05-02 | — | — | CN | disclosed |
| CN-111684320-A | Optical filter and device using the same | JSR株式会社 | 2020-09-18 | — | — | CN | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |