Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 4/20 | 0.40 |
| ▸ | GLA | P06280 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | HTT | P42858 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | ITGB1 | P05556 | 1/20 | 0.35 |
| ▸ | ITGA4 | P13612 | 1/20 | 0.35 |
| ▸ | PRKCA | P17252 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3207184 | 1.00 | HSD11B1 (0.40) | HSD11B1GLAALDH1A1TSHRHTT | |
| SCHEMBL595456 | 0.85 | HSD11B1 (0.40) | HSD11B1GLAALDH1A1TSHRHTT | |
| SCHEMBL546491 | 0.85 | HSD11B1 (0.40) | HSD11B1GLAALDH1A1TSHRHTT | |
| SCHEMBL11098060 | 0.79 | KDM4E (0.40) | HSD11B1GLAALDH1A1TSHRHTT | |
| SCHEMBL524018 | 0.76 | GLA (0.44) | HSD11B1GLAALDH1A1HTTKDM4E | |
| SCHEMBL2026422 | 0.76 | GLA (0.44) | HSD11B1GLAALDH1A1HTTKDM4E | |
| SCHEMBL906383 | 0.76 | GLA (0.44) | HSD11B1GLAALDH1A1HTTKDM4E | |
| SCHEMBL1218819 | 0.76 | GLA (0.44) | HSD11B1GLAALDH1A1HTTKDM4E | |
| SCHEMBL524017 | 0.76 | GLA (0.44) | HSD11B1GLAALDH1A1HTTKDM4E | |
| SCHEMBL14777571 | 0.70 | CA2 (0.44) | HSD11B1GLAALDH1A1HSD17B10L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7608390-B2 | Photoresists; for immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-10-27 | — | — | US | claimed |
| US-8304178-B2 | Top antireflective coating composition containing hydrophobic and acidic groups | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-06 | — | — | US | disclosed |
| US-20100047712-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-02-25 | — | — | US | disclosed |
| US-7608390-B2 | Photoresists; for immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-10-27 | — | — | US | disclosed |
| US-20080032228-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-07 | — | — | US | disclosed |