Perchlorate

Perchlorate

SCHEMBL2026951

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nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Perchlorate. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Perchlorate SCHEMBL3798359 1.00
Perchlorate SCHEMBL143106 0.91
Perchlorate SCHEMBL29818049 0.91
Perchlorate SCHEMBL1701054 0.83
Perchlorate SCHEMBL1141945 0.83
Perchlorate SCHEMBL723484 0.83
Perchlorate SCHEMBL2685167 0.83
Perchlorate SCHEMBL4653673 0.83
Perchlorate SCHEMBL246911 0.83
Perchlorate SCHEMBL2186380 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10462908-B2 Conductive patterns and methods of using them ALPHA ASSEMBLY SOLUTIONS INC. (US) 2019-10-29 US disclosed
EP-2064000-B1 SOLVENT SYSTEMS FOR METALS AND INKS ALPHA ASSEMBLY SOLUTIONS INC (US) 2018-01-17 EP disclosed
US-20170164484-A1 Conductive Patterns and Methods of Using Them CITIBANK, N.A. 2017-06-08 US disclosed
US-9615463-B2 Method for producing a high-aspect ratio conductive pattern on a substrate CITIBANK, N.A. 2017-04-04 US disclosed
EP-2174324-B1 METHOD OF MANUFACTURING PRINTED CIRCUIT BOARD ALPHA METALS (US) 2017-01-11 EP disclosed
US-9217088-B2 Particles and inks and films using them ALPHA METALS, INC. (US) 2015-12-22 US disclosed
US-20140186524-A1 SOLVENT SYSTEMS FOR METALS AND INKS ALPHA METALS, INC. (US) 2014-07-03 US disclosed
EP-2380688-B1 Particles and Inks and Films Using Them ALPHA METALS (US) 2014-06-04 EP disclosed
US-8597548-B2 Solvent systems for metals and inks ALPHA METALS, INC. (US) 2013-12-03 US disclosed
EP-2066470-B1 METHODS OF PREPARING SILVER PARTICLES, SILVER PARTICLE INKS AND SILVER PARTICLE FILMS FRY METALS INC (US) 2013-10-09 EP disclosed
EP-2174324-A1 CONDUCTIVE PATTERNS AND METHODS OF USING THEM Fry's Metals, Inc. (US) 2010-04-14 EP disclosed
EP-2066470-A1 PARTICLES AND INKS AND FILMS USING THEM Fry's Metals, Inc. (US) 2009-06-10 EP disclosed
EP-2064000-A2 SOLVENT SYSTEMS FOR METALS AND INKS Fry's Metals, Inc. (US) 2009-06-03 EP disclosed
WO-2009020464-A9 CONDUCTIVE PATTERNS AND METHODS OF USING THEM FRY METALS INC (US) 2009-04-30 WO disclosed
WO-2009020464-A1 CONDUCTIVE PATTERNS AND METHODS OF USING THEM FRY'S METALS, INC. (US) 2009-02-12 WO disclosed
US-20080145560-A1 Used with capped metal (silver) particles to provide a dispersion that may be used to print conductive lines CITIBANK, N.A. 2008-06-19 US disclosed
US-20080137316-A1 CONDUCTIVE PATTERNS AND METHODS OF USING THEM CITIBANK, N.A. 2008-06-12 US disclosed
WO-2008036752-A2 SOLVENT SYSTEMS FOR METALS AND INKS FRY'S METALS, INC. (US) 2008-03-27 WO disclosed
WO-2008017062-A1 PARTICLES AND INKS AND FILMS USING THEM FRY'S METALS, INC. (US) 2008-02-07 WO disclosed
US-20080032047-A1 PARTICLES AND INKS AND FILMS USING THEM CITIBANK, N.A. 2008-02-07 US disclosed