Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARP1 | P09874 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.38 |
| ▸ | CES2 | O00748 | 2/20 | 0.36 |
| ▸ | CES1 | P23141 | 2/20 | 0.36 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.34 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | CA1 | P00915 | 2/20 | 0.33 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | AKR1C4 | P17516 | 1/20 | 0.33 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.33 |
| ▸ | AKR1C2 | P52895 | 1/20 | 0.33 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL985711 | 0.94 | PARP1 (0.38) | PARP1POLBHCAR2CES2CES1 | |
| SCHEMBL6133362 | 0.91 | POLB (0.47) | POLBHCAR2ALDH1A1TSHRTP53 | |
| SCHEMBL29912760 | 0.85 | TPMT (0.44) | PARP1POLBHCAR2GPR35 | |
| SCHEMBL986020 | 0.85 | TPMT (0.44) | PARP1POLBHCAR2GPR35 | |
| SCHEMBL38576 | 0.85 | ALDH1A1 (0.40) | CES2CES1ALDH1A1TSHRTP53 | |
| SCHEMBL5225361 | 0.84 | CES2 (0.44) | PARP1POLBHCAR2CES2CES1 | |
| SCHEMBL10262794 | 0.84 | PARP1 (0.32) | PARP1POLBHCAR2CES2CES1 | |
| SCHEMBL3397238 | 0.84 | PARP1 (0.32) | PARP1POLBHCAR2CES2CES1 | |
| SCHEMBL15700662 | 0.84 | TPMT (0.43) | PARP1POLBHCAR2GPR35NOTUM | |
| SCHEMBL31327392 | 0.84 | CES2 (0.44) | PARP1POLBHCAR2CES2CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119286020-B | Preparation method of antistatic wear-resistant protective film material | 河北舒莱美德塑料薄膜材料科技股份有限公司 | 2025-04-22 | — | — | CN | claimed |
| CN-119350223-A | Thermosensitive ultra-long room temperature phosphorescence organic small molecule gel and anti-counterfeiting application | 三峡大学 | 2025-01-24 | — | — | CN | claimed |
| CN-119286020-A | Preparation method of antistatic wear-resistant protective film material | 河北舒莱美德塑料薄膜材料科技股份有限公司 | 2025-01-10 | — | — | CN | claimed |
| CN-100534922-C | Water treating process and system with antioxidant composite reverse osmosis film | GUIYANG SHIDAI HUITONG MEMBRAN (CN) | 2009-09-02 | — | — | CN | claimed |
| CN-100534923-C | Household water purifying process and system | GUIYANG SHIDAI HUITONG MEMBRAN (CN) | 2009-09-02 | — | — | CN | claimed |
| CN-100478056-C | Oxidation resistant compound reverse osmosis membrane | VONTRON MEMBRANE TECHNOLOGY CO (CN) | 2009-04-15 | — | — | CN | claimed |
| US-20080203013-A1 | OXIDATION-RESISTANT COMPOSITE REVERSE OSMOSIS MEMBRANE | VONTRON MEMBRANE TECHNOLOGY CO., LTD. (CN) | 2008-08-28 | — | — | US | claimed |
| WO-2008025259-A1 | OXIDATION-RESISTANT COMPOSITE REVERSE OSMOSIS MEMBRANE | VONTRON MEMBRANE TECHNOLOGY CO., LTD. (CN) | 2008-03-06 | — | — | WO | claimed |
| EP-1894614-A1 | Oxidation-resistant composite reverse osmosis membrane | Vontron Membrane Technology Co Ltd (CN) | 2008-03-05 | — | — | EP | claimed |
| CN-101130155-A | Oxidation resistant compound reverse osmosis membrane | VONTRON MEMBRANE TECHNOLOGY CO (CN) | 2008-02-27 | — | — | CN | claimed |
| WO-2025128334-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| WO-2025128332-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| WO-2025128333-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| US-20250188311-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250188312-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-6168649-B1 | THIN DISCRIMINATING LAYER SELECTED FROM THE GROUP CONSISTING OF POLYCARBONATE, POLYESTER, AND POLYESTERCARBONATE. | MG GENERON, INC. | 2001-01-02 | — | — | US | disclosed |
| WO-2000033949-A1 | MEMBRANE FOR SEPARATION OF XENON FROM OXYGEN AND NITROGEN AND METHOD OF USING SAME | MESSER GRIESHEIM GMBH (DE) | 2000-06-15 | — | — | WO | disclosed |
| EP-0113252-B1 | PROCESS FOR PRODUCING BLOCK COPOLYAMIDE | TORAY INDUSTRIES, INC. (JP) | 1991-08-07 | — | — | EP | disclosed |
| US-4507465-A | IMPACT STRENGTH | TORAY INDUSTRIES, INC. (JP) | 1985-03-26 | — | — | US | disclosed |
| US-4001179-A | Bis-(tetrahalophthalimidocarbonyl)-benzene | VELSICOL CHEMICAL CORPORATION (US) | 1977-01-04 | — | — | US | disclosed |