SCHEMBL20439442

SCHEMBL20439442

CCC1CC2CC(C1)CC(C)(COc1ccc(S(=O)(=O)O)cc1)C2

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 2/20 0.38
AOC2 O75106 1/20 0.37
MAOA P21397 1/20 0.37
MAOB P27338 1/20 0.37
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.34
RAB9A P51151 1/20 0.34
PKM P14618 1/20 0.34
MMP1 P03956 3/20 0.34
MMP9 P14780 2/20 0.34
MMP3 P08254 2/20 0.34
MMP7 P09237 1/20 0.34
GPR119 Q8TDV5 4/20 0.34
MMP2 P08253 2/20 0.34
MMP13 P45452 2/20 0.34
ADAM17 P78536 1/20 0.34
GAA P10253 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
YAP1 P46937 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26796017 0.81 PKM (0.39) KMT2ASMN1; SMN2PKMMMP9MMP3
SCHEMBL2611718 0.79 SCN9A (0.44) MEN1KMT2ARAB9AGAASCN9A
SCHEMBL16812085 0.69 GAA (0.67) MEN1KMT2AGAA
SCHEMBL755720 0.67 CA12 (0.66) MEN1KMT2ASMN1; SMN2PKMGAA
SCHEMBL20340810 0.67 ALDH1A1 (0.33) MEN1KMT2A
Hydrochloric Acid SCHEMBL11519194 0.66 CA12 (0.63) MEN1KMT2ASMN1; SMN2PKMGAA
SCHEMBL11087708 0.66 CA12 (0.63) MEN1KMT2ASMN1; SMN2PKMGAA
SCHEMBL15243087 0.65 AOC2 (0.31) AOC2MAOAMAOBMMP1MMP9
SCHEMBL28341984 0.65 CYP2C9 (0.45) KMT2ARAB9AMMP1MMP13GAA
SCHEMBL18088474 0.65 PARP15 (0.56) PKMGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10962884-B2 Treatment liquid and pattern forming method FUJIFILM CORPORATION (JP) 2021-03-30 US disclosed
US-20180217503-A1 TREATMENT LIQUID AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2018-08-02 US disclosed